Used AMAT / APPLIED MATERIALS Chamber for P5000 #9255084 for sale

AMAT/APPLIED MATERIALS P5000 AMAT / APPLIED MATERIALS Chamber for P5000 is a high-efficiency, multi-mode vacuum reactor used for many processes in the semiconductor industry. It is used for the etching, deposition and annealing of wafers. It is equipped with an advanced vacuum equipment, advanced power and gas delivery systems, and an integrated controller. The P5000 chamber provides efficient and precise control of the reaction conditions, including pressure, temperature and gas composition. The P5000 system features a sealed, high-temperature vacuum chamber. This chamber has a double door design to provide efficient insulation against thermal and process gases. The chamber's walls are made of quartz which is able to withstand the high temperatures and intensity of the process. The chamber has an interior volume of 5.9 liters and can be sealed to a base pressure of 10−6Torr. The P5000 chamber utilizes advanced process pumps, mass flow controllers and gas distribution valves to precisely regulate gas flows and pressures. The mass flow controllers ensure accurate control of gas flow rates and in line mixing of multiple gases. The P5000 chamber comes equipped with an advanced power delivery unit. It includes a planar RF source with a broad frequency range of 50 Hz-1 MHz, and a hot filament source with a frequency range of up to 4 MHz. The power delivery machine allows for precise control of power levels and uniformity of the plasma, enabling uniform reactive ion etch processes. The P5000 tool also features a high-resolution temperature controller with the ability to ramp the temperature up to 1000°C. The integrated controller of the P5000 asset allows for easy and efficient operation of the reactor. Its touchscreen interface makes it easy to access tasks, and its advanced programming options allow for optimal process control. The P5000 also comes equipped with varying safety features such as pressure control, stall detection, and thermal protection. AMAT / APPLIED MATERIALS/AMAT P5000 Chamber is a versatile and reliable solution for many processes in the semiconductor industry. Its advanced vacuum, power and gas delivery systems, integrated controller, and safety features help to ensure efficient and precise process control. The P5000 is capable of performing etching, deposition, annealing and other processes on a variety of wafers.