Used AMAT / APPLIED MATERIALS CPI-VMO Chamber Endura PVD #9214657 for sale

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ID: 9214657
Wafer Size: 12"
Vintage: 2006
12" Includes: Make / Model / Description CTI CRYOGENICS / P300 / On-board cryopump AMAT/APPLIED MATERIALS / PVD / Controller GRANVILLE-PHILLIPS / 352 / Gauge & controller - / - / Machine controller SANYO DENKI / - / PM Driver - / 0010-04974 / Remote AC box - / 0100-00567 / Gas box distribution PCB - / - / CDN 396 Card - / - / CDN 391 Card - / - / PVD/IMP Chamber interlock card 2006 vintage.
AMAT / APPLIED MATERIALS CPI-VMO Chamber Endura PVD is a high-performance physical vapor deposition (PVD) tool for sputtering, evaporation, RTP, etching, and ion implantation applications. The equipment allows for versatile processing in one automated chamber, providing unparalleled process repeatability and repeatable uniformity of layer thickness over large wafer areas. This tool is specifically designed for advanced materials development and process analysis. AMAT CPI-VMO Chamber Endura PVD includes a VMO Magnetron source, a multi-zone susceptor, and a multi-zone heat shield as standard features. The VMO Magnetron source is a single-ended, high-rate sputtering source driven by a high-voltage, high-frequency AC power supply. The VMO Magnetron source provides uniform sputtering rate over wafer area by utilizing media decks for a low-input power operation during long-term deposition. The multi-zone susceptor is designed to selectively heat or cool target area to prevent backscattering or post-sputtering. Additionally, the multi-zone susceptor features adjustable pressure balancing gears, which aid in process control and uniform heating. APPLIED MATERIALS CPI-VMO Chamber Endura PVD also includes multi-zone heat shields for improved plasma containment and uniform deposition rates over a wider process window. The multi-zone heat shields feature adjustable baffles and reactor wall protection, allowing for precise control of the deposition flux inside the tool. Furthermore, CPI-VMO Chamber Endura PVD includes an advanced, real-time, automated control system with multivariable process analysis. Real-time monitoring and paperless TQM unit provide feedback on process performance in real-time. The on-board powerful control machine also features process modeling, gatekeeper quality assurance tool, and automatic fine-tuning optimization for real-time process optimization. AMAT / APPLIED MATERIALS CPI-VMO Chamber Endura PVD is designed for reliability and long-term performance with years of sputtering to come. With a unique combination of features and technology, this tool is built to produce high-quality films quickly and efficiently. AMAT CPI-VMO Chamber Endura PVD is the ideal choice for those looking for a long-term, reliable, and energy efficient PVD solution for production and analytical needs.
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