Used AMAT / APPLIED MATERIALS DPN #148641 for sale

AMAT / APPLIED MATERIALS DPN is a tool used in the fabrication of integrated circuits (ICs). It is a type of plasma reactor used to form dielectric films on silicon wafers. AMAT DPN consists of four components; a vacuum chamber, a radio-frequency (RF) plasma generator, an electrode, and a recipe controller. The vacuum chamber is a cylindrical vessel with an inner diameter of typically between 0.35 and 2.13 meters. It is made from stainless steel and typically vacuum sealed with an oil diffusion pump. It holds the substrate, which is typically a silicon wafer, during the deposition process. The RF plasma generator is used to generate the positively charged ions and electrons required for the deposition process. This RF generator produces a high frequency (HFRF) waveform that is supplied to an antenna which is inserted in the vacuum chamber. This waveform is modulated to direct the flow of ionized particles that are used to deposit the desired material on the wafer. The generator is powered by a few different components including a high voltage power supply, a waveform generator, and a waveform monitor. The electrode is mounted inside the vacuum chamber and is made of aluminum, tungsten, or copper. The shape and size of the electrode varies depending on the type of deposition taking place. For example, a planar electrode is typically used for diffusion applications, while an annular electrode is used for chemical vapor deposition (CVD) applications. The recipe controller is a computer system that controls the parameters used during the deposition process. This includes the timing and intensity of the HFRF waveform, the electrode power level and temperature, the temperature and pressure within the vacuum chamber, and the pulse frequency of the deposition. It is responsible for ensuring that the deposition process is done accurately and in accordance with the customer's requirements. In conclusion, APPLIED MATERIALS DPN is a tool used in the fabrication of integrated circuits. It is composed of four components; a vacuum chamber, a RF plasma generator, an electrode, and a recipe controller. DPN produces positively charged ions and electrons that are used to deposit a dielectric film on a substrate, typically a silicon wafer. With the aid of the recipe controller, the deposition process is precisely controlled to produce a layer of material on the wafer in accordance with the customer's requirements.