Used AMAT / APPLIED MATERIALS DPS G5 Mesa #9270845 for sale

AMAT / APPLIED MATERIALS DPS G5 Mesa is a poly-crystalline silicon chemical vapor deposition (CVD) reactor designed for research and development (R&D) applications. The CVD reactor is capable of depositing high-quality thin-film silicon on large-area substrates, with superior uniformity and repeatability. The G5 Mesa utilizes high-pressure direct-injection (DPI) delivery technologies to create a monolayer homogeneous distribution of reactant gases on the substrate surface for high-quality and high-yield processes. The reactor also includes a low-pressure microwave-plasma source to increase process uniformity, throughput, and productivity by providing excellent silicon quality and uniformity on large-sized substrates. The reactor consists of a chamber with the process module, delivery control equipment, vacuum pump, partial/total pressure control system, power unit, pressure control machine, temperature control tool, gas delivery asset, and process control model. The chamber is loaded with a substrate carrier, and the pedestal includes a direct-injection source of reactant gases and a microwave-plasma source. The G5 Mesa has a solid-state memory storage device, a Programmable Logic Controller (PLC), and a graphical user interface (GUI), which allows users to set process parameters, monitor the status, and receive reports. The PLC provides precise control of all parameters in real-time. It also features an advanced data acquisition equipment, allowing for the recording and monitoring of system pressures, gas flows, temperatures, and microwave generator performance in real-time. The G5 Mesa is designed to operate in a temperature range of 300-1000°C. It is also equipped with multiple process windows, allowing process developers to control film properties at different temperatures and pressure levels. Furthermore, the G5 Mesa offers a high-pressure flow delivery control unit, a low-pressure microwave-plasma source, and an automatic shut-off machine that prevents contamination of samples and atmosphere. AMAT DPS G5 Mesa chemical vapor deposition reactor was designed to provide efficient and reliable deposition of homogeneous monolayers of silicon on large-area substrates. With its user-friendly graphical user interface, precision process control and data acquisition systems, and advanced DPI and low-pressure microwave-plasma source, the G5 Mesa enables the deposition of high-quality thin-film silicon with superior uniformity and repeatability.