Used AMAT / APPLIED MATERIALS DPS G5 Mesa #9271010 for sale

AMAT / APPLIED MATERIALS DPS G5 Mesa is a high-temperature reactor specifically designed for the deposition of thin films in the semiconductor and optoelectronic industries. This reactor is based on the principle of chemical vapor deposition (CVD) and utilizes a hot-wire approach to produce single-crystal films. The equipment offers an exceptional level of control, allowing operators to create very uniform coatings with excellent adhesion properties. The CVD process takes place in a quench-resistant quartz tube, which makes it suitable for compatibility with a wide range of inert and corrosive gasses. AMAT DPS G5 Mesa is a fully automatic semiconductor reactor and is capable of reaching temperatures of up to 1200°C. It is equipped with an intricate temperature control system and advanced thermodynamic sensors to ensure uniform thermal management throughout the deposition process. The reactor can be operated in a continuous mode or in a pulsed-mode with the ability to adjust deposition rate parameters in order to accurately tune the performance of the reactor. It is also equipped with a masker unit that facilitates switching between different deposition rates or even depositing different materials in different areas of the quartz tube. In addition to the conventional CVD process, APPLIED MATERIALS DPS G5 Mesa also supports a variety of advanced processes such as multi-film deposition, ion bombardment, sputtering, pulsed-plasma deposition and evaporation. These processes have a variety of applications in the semiconductor industry, ranging from surface modification to dielectrics, conductors, 3D nano-structures, or even optoelectronic materials. DPS G5 Mesa also offers a wide range of safety features, including automated pressure and temperature controls, leak detection, and an emergency shutoff. To ensure reliable operation, the machine is equipped with a wide range of built-in safety features. These features, combined with the cleanroom-grade vacuum environment provided by the unit, make it an ideal choice for a variety of advanced material deposition processes.