Used AMAT / APPLIED MATERIALS Electra #9088658 for sale

AMAT / APPLIED MATERIALS Electra is a large-scale chemical vapor deposition (CVD) reactor belonging to the family of efficient thin film deposition systems. This versatile reactor is designed to deposit a wide range of material layers, including metals, oxides, nitrides, and carbides onto both rigid and flexible substrates such as glass, film, ceramics, and polymers. AMAT Electra's efficient performance is achieved by the integrated process control features such as automated wafer handling, real-time tuning, and in-situ process monitoring. APPLIED MATERIALS Electra utilizes three primary components to deposit ultra-thin films on substrate surfaces: an enclosed gas flow equipment, a turbomolecular pump, and a low-pressure vacuum chamber. The enclosed gas flow system contains a combination of gas inlets and outlets, designed for both gas inlet and exhaust flow. This unit provides an accurate, continuously controlled supply of gases to Electra's reaction chamber. The turbomolecular pump is an independent subsystem connected to the reaction chamber, and its purpose is to evacuate the chamber to a pressure range suitable for CVD processing. Finally, the low-pressure chamber is an isolator equipped with an integrated exhaust machine that contains independent isolation chambers. AMAT / APPLIED MATERIALS Electra reactor is capable of depositing a wide range of material layers over a broad range of substrate materials. This tool offers excellent film uniformity, with a uniformity index (measured in terms of Reflection High-Energy Electron Diffraction) of better than 4E-04. A number of different films can be studied on AMAT Electra, such as metal oxides, nitrided films, and multilayer systems. The versatility of this reactor is further enhanced by the flexibility to form different surface morphology, which can be customized based on customer requirements. APPLIED MATERIALS Electra also offers a wide array of features for process optimization and control. The real-time tuning feature enables the optimization of the deposition process in a wide range of conditions. In addition, the in-situ monitoring feature enables the operators to monitor the recipe parameters in real time, making it possible to diagnose problems quickly and efficiently. The automated wafer handling also helps to minimize downtime and maximize throughput. In conclusion, Electra is an advanced CVD asset that provides the capability to deposit ultra-thin films on a wide range of substrates. The features of AMAT / APPLIED MATERIALS Electra, such as its wide range of gas flows and process optimization, enable both continuous and automated operation for efficient deposition. AMAT Electra is suitable for a variety of thin film applications, such as metal oxides, nitrided films, and multi-layer systems, making it one of the most versatile deposition systems available.