Used AMAT / APPLIED MATERIALS Enabler #293753880 for sale

AMAT / APPLIED MATERIALS Enabler is an advanced high-temperature thermal reactor designed for use in processing a range of materials. This reactor is also known as a plasma enhanced CVD or chemical vapor deposition reactor and is mainly used in the semiconductor industry. It is a multi-chamber equipment with a central processing chamber which houses the plasma generation source and is surrounded by an array of quartz walls. The chamber walls are insulated to maintain a consistently high temperature and ensure homogenous distribution of heat throughout the chamber. The system is designed to control the deposition of thin films or overcoat layers on microchips or wafers. This is achieved by passing gases such as oxygen, nitrogen, gas doped silicon, or a combination of these through an inductively coupled plasma (ICP) source. The ICP source is designed to produce the requisite ionized particles or ions which are then directed towards the substrate surface. This creates a reaction between the wafer surface and the ionized particles, resulting in heat being generated which results in the deposition of layer films on the substrate. AMAT Enabler is designed with several safety features in mind. The unit has been tested to meet industry standard pressure and temperature requirements and is designed to be able to handle peak temperature up to 1000°C. The machine also comes equipped with a hydraulic shutter and advanced pressure and temperature control mechanisms which allow for precise control and monitoring of the deposition process. The tool is designed to provide a high rate of deposition and can process a range of metals and materials including silicon, titanium, tungsten, and others. This reactor is highly valued for its flexibility and energy efficiency features, and is a reliable choice for a range of semiconductor manufacturing and engineering applications.