Used AMAT / APPLIED MATERIALS Enabler #9093620 for sale

AMAT / APPLIED MATERIALS Enabler
ID: 9093620
Wafer Size: 12"
Vintage: 2009
Oxide etcher, 12", 2009 vintage.
AMAT / APPLIED MATERIALS Enabler is a state-of-the-art, high-efficiency reactor designed to facilitate the deposition of thin films for semiconductor and optoelectronic applications. The equipment offers a wide range of deposition chemistries and material combinations, a high throughput, and high process repeatability. AMAT Enabler offers great flexibility through its Programmable Process Controller (PPC), enabling users to quickly and easily set process parameters and monitor the reactor operation in real-time. At the core of APPLIED MATERIALS Enabler is its advanced electron cyclotron resonance (ECR) plasma source. This source operates at a low pressure to enable the formation of energetic species that can deposit material at higher rates and with higher uniformity than other kinds of sources. The discharge is then transported to the growth surface by an adjustable mag-jet system, which is designed to create a uniform flux of particles over the entire substrate. This unit can also be used to create an adjustable, high-energy zone for difficult films, such as silicon nitride or gallium arsenide. In order to ensure consistent process results, Enabler is equipped with a programmable gas blending machine and overpressure protection, as well as automated gas motion control. This helps reduce gas line cross-contamination and gas ingestion problems. Additionally, the tool is designed with a total of three process zones. These zones are arranged in an inverted-V configuration to optimize the uniformity, providing uniform deposition across the full substrate size. AMAT / APPLIED MATERIALS Enabler also offers comprehensive process diagnostic capabilities. It is able to maintain the reactor environment and monitor process parameters, such as pressure, temperature, and flow rate. This allows optimization of the deposition process and minimization of defects. Additionally, an optical pyrometer can be used to measure the lateral temperature profile across the substrate for process optimization. AMAT Enabler is a full-featured, user-friendly deposition asset designed to provide high-quality thin-film deposition capabilities. Its high efficiency, versatility, and comprehensive diagnostic capabilities can be used to deposit a wide range of materials and combinations with repeatable, high-quality results. With its PPC, users can easily set process parameters, monitor reactor operation, and optimize the deposition process. This makes APPLIED MATERIALS Enabler a valuable model for creating high-quality thin-film semiconductor and optoelectronic applications.
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