Used AMAT / APPLIED MATERIALS Endura 2 DSTTN #9364585 for sale

AMAT / APPLIED MATERIALS Endura 2 DSTTN is an advanced-technology atmospheric chemical vapor deposition (APCVD) reactor used for materials processing in semiconductor, MEMS, and other industries. Its unique gas flow dynamics allows for uniformity of deposition at higher deposition rates and ultimate quality. The single wafer chamber design creates a cycle-time and cost-effective solution used in a variety of processes. AMAT Endura 2 DSTTN features advanced process capabilities like sophisticated recipe control, precise gas flows, multiple source gas outlets, and a load/unload system. It has a fully-integrated and locked-down deposition chamber, allowing for process-sensitive and high-yields of advanced semiconductor devices. Additionally, the proprietary Dewar design allows for high-gas pressure operation and high acceptance rate of substrates. The reactor works by introducing four distinct gas feeds, each with a different chemistry and reactant. These gases are then heated and their composition altered by a tail-dissipation plate. By accurately controlling the temperature, flow, and composition, the exact materials needed for the device-under-construction can be formed on the substrate body. APPLIED MATERIALS Endura 2 DSTTN is uniquely designed to reduce unwanted reaction byproducts in deposition process. By utilizing a built-in gas-flow uplift mechanism, fast conversion rates and selective-area deposition are achieved, leading to higher yields than traditional systems. Additionally, the reactor incorporates a dynamic source control technology which enables precise film coatings at process temperatures up to 1000°C. Endura 2 DSTTN is the ideal tool for the rapid development of advanced semiconductor devices, resulting inrepeatable, high-volume production with total process control. Its precision CVD chamber makes it possible to produce ultra-thin films for intricate and very small devices. Furthermore, the Dewar design allows for flexibility and a dependable repeatability in temperatures up to 1000°C, ensuring optimum process results.