Used AMAT / APPLIED MATERIALS Endura 2 #293815145 for sale

AMAT / APPLIED MATERIALS Endura 2 reactor is a chemical vapor deposition (CVD) equipment used for the production of semiconductor and other types of electronic devices. As a fully-automated creation and deposition system, AMAT Endura 2 is used to produce and deposit thin films of material on a variety of substrates through a process known as thermal oxidation. APPLIED MATERIALS Endura 2 reactor is capable of precise temperature and pressure control during its cycle and has adjustable gas flow rate capabilities. This allows users to accurately control the reactive environment of the reactor, resulting in exceptional control over the deposition rate of the materials being deposited and the uniformity of the resulting thin films. Endura 2 is designed to be highly efficient and easy to use, allowing for rapid solid-to-solid processing with reduction of waste and the increasing of both process yield and throughput. It utilizes two independent reactor chambers to enable automated dual process capability and reduced cycle times within the same chamber. AMAT / APPLIED MATERIALS Endura 2 offers a variety of features and customization options to provide a reliable and powerful unit to meet your processing needs. It can be configured for inline process tubes and wafer carriers for larger-scale production, or for manual wafer loading for small-scale production. It also includes automated lifting and transfer mechanisms for developing automated spin-on and spray coatings. AMAT Endura 2 reactor has been designed to offer superior temperature control throughout its operational cycle, as well as a wide range of calibration settings. Through its touchscreen environment, the users can program their desired process recipes with exact precision and repeatability. Its advanced internals feature real-time monitoring of process parameters to ensure consistent and reliable wafer results. Overall, APPLIED MATERIALS Endura 2 reactor is a reliable, efficient, and robust machine designed to create and deposit thin films of different materials on a variety of substrates. It is ideal for use in small- or large-scale production and its features and customization options allow users to create a reliable and powerful CVD tool for their specific needs.