Used AMAT / APPLIED MATERIALS Endura 2 #293827407 for sale

ID: 293827407
Vintage: 2015
Physical Vapor Deposition (PVD) system Part number / Description 0410-10000 / System, 12" FAM300E2 / MDP E2 Endura, 12" 0415-10014 / - 0415-10346 / Impulse AIN 0415-10046 / Dual mode degas 0415-10054 / RGA Manual valve 0395-09095 / Infopad pos A or B 0395-09026 / E78 Ionizer 0395-09073 / Upper E84 Data logging sensors and cables 0395-09071 / TIRIS with RF E99 Carrier ID 0395-00114 / Operator access switch 0395-09056 / Remote flat panel monitor on stand 0395-09007 / Effective 75 Feet with 66 Feet 0415-10080 / Umbilical’s 75 Feet Mainframe to equipment rack TR-STND-22 / Standard training package WT-12MO / Standard 12-month warranty 0415-10082 / FIF Generic kit 0415-10089 / Lifting aids 0415-10090 / Maintenance lift 0395-09029 / FI Align and levelling tool kit 0395-09039 / Ionizer calibration tools 0395-09055 / Outrigger levelling tools 0395-09031 / FI Service lift 0395-09123 / Load Port Service Tool (7) Salop 0395-09013 / Controller recovery tools 0395-09066 / YAT Teach tools, 12” 0415-10288 / Cons kit - Impulse 0415-10313 / Shutter disk, ESC, Ti, AL Arc spray 2015 vintage.
AMAT / APPLIED MATERIALS Endura 2 reactor is a revolutionary product for semiconductor manufacturing processes. It offers industry-leading performance and cost-efficiency. This advanced equipment yields maximum throughput, superior product quality, and low particle count. AMAT Endura 2 reactor encompasses both single-wafer and batch configurations, making it a versatile option for multiple markets. The system is composed of various components, including the processing chamber, the quartz chamber, and a load-lock chamber. Its liquid delivery unit and in-situ wafer characterization tools enable users to fine-tune their processing for optimal results. APPLIED MATERIALS Endura 2 is powered by AMAT patented Krypton™ gas control machine. This innovative device precisely mixes gas compositions for optimal wafer etching, as well as dielectric deposition and photolithography. The tool also comprises automated recipe-driven process control technologies, allowing high-precision temperature and pressure control for fine-tuned wafer-to-wafer process uniformity. In addition, Endura 2 offers a flexible vacuum platform for multiple application needs. This results in optimal uptime and delivers reduced operation and maintenance costs. It also comes with the OPTIMMIX™ feature, which helps incorporate diagnostics and analytics for functional layer uniformity verification, ensuring high-precision operation during critical photolithography steps. Overall, AMAT / APPLIED MATERIALS Endura 2 reactor is an advanced tool for semiconductor device fabrication. It is designed to revolutionize processing performance with higher throughput, superior product quality, and cycle time savings. Its advanced features make it a great choice for precision microelectronic operations that require optimum accuracy.
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