Used AMAT / APPLIED MATERIALS Endura 2 #293827408 for sale

AMAT / APPLIED MATERIALS Endura 2 is a highly advanced cold wall, single-wafer, production-class reactor that offers manufacturers with reliable and cost-efficient processing capabilities for semiconductor materials. The reactor features a temperature control of up to 1120 ˚C and offers a pressure and temperature control of up to high-7 torr. This enables it to perform processes such as single-wafer deposition, atomic layer deposition (ALD), chemical vapor deposition (CVD), and plasma-enhanced CVD (PECVD). The reactor is designed to accommodate up to 30" wafers and includes a series of features that enable users to customize the reactor to their desired processing requirements. For example, AMAT Endura 2 features an innovative, self-cleaning showerhead, which helps minimize contamination of the process chamber and ensures uniformity of the process inseam. It also includes a thermal control equipment and multiple valves that enable users to adjust the gas flow and temperature of the system. Additionally, APPLIED MATERIALS Endura 2 includes a inert dual-ring exhaust unit, which helps to draw the process species from the reactor for evacuation, as well as a cooling machine that aids in the protection of the process chamber during operation. In terms of process control, the reactor comes with a unique smart tester that helps to measure parameters such as specimen temperatures, pressures, gas flows, and waveforms. This helps ensure reliable process optimization and uniformity. Endura 2 also features an intuitive, user-friendly Graphical User Interface (GUI), which simplifies setup and control of the tool. Furthermore, AMAT / APPLIED MATERIALS Endura 2 includes an efficient cleaning asset that ensures thorough cleaning of the model between each process cycle. The reactor also offers a range of options for exam features, such as Hot-Wall, and advanced application-specific features, such as Peressurization, which helps maximize process efficiency. AMAT Endura 2 is an incredibly advanced and reliable semiconductor processing reactor that delivers tremendous performance and cost efficiency for the manufacturers. It features reliable temperature, pressure, and gas flow control, an intuitive GUI interface, and an efficient cleaning equipment, all of which help to ensure efficient and uniform processing of semiconductor materials.