Used AMAT / APPLIED MATERIALS Endura 300mm Chamber #9125373 for sale

AMAT (APPLIED MATERIALS) Endura 300 mm Chamber is a production-class chemical vapor deposition wafer reactor that enables flexible and precise deposition of thin films to substrate wafers and other substrates. This innovative chemical vapor deposition equipment is designed for semiconductor, LED, micro-electro-mechanical systems, and optoelectronic applications. The system enables materials to be deposited at low pressure for crystalline thin films, at controlled temperature for optimal vapor absorption, and with precise flux control. AMAT / APPLIED MATERIALS Endura 300 mm Chamber includes a vertical reactor chamber with a high-accuracy vacuum seal, an automated precise gas injection unit, and a materials feed manifold. This allows for uniform thin film deposition over the entirety of the wafer substrate. The automated gas injector machine ensures accurate and repeatable deposition by accurately controlling and regulating the gas feed flow rate. The feed manifold, in turn, allows for precise and uniform gas distribution across the entire wafer surface area to prevent variability in film characteristics. In addition, the reactor is outfitted with independent temperature control for both the substrate heater and the furnace nichrome heating elements, allowing for precise temperature control and optimal vapor absorption. The chamber also features an integrated process control loadlock, allowing for faster deposition times and greater production throughput. Additionally, its self-aligning magnetic levitating bearing enables minimal transfer runout, allowing for precise and uniform film deposition. The overall design of AMAT Endura 300 mm Chamber is focused on efficient deposition of high-quality thin films. This advanced chamber can process both complex patterns and basic single-layer substrates without difficulty. It is faster, more reliable, and more cost-effective than other traditional deposition systems, making it an ideal choice for high-throughput production masks and deposition of niche materials.