Used AMAT / APPLIED MATERIALS Endura 5500 VHP #9373207 for sale

AMAT / APPLIED MATERIALS Endura 5500 VHP
ID: 9373207
Wafer Size: 2"-6"
PVD Sputtering system (4) Chambers.
AMAT / APPLIED MATERIALS Endura 5500 VHP is an advanced chemical vapor deposition (CVD) reactor that is designed to facilitate the deposition of various materials, such as silicon and dielectric films, as well as a variety of other materials. AMAT Endura 5500 VHP reactor uses a process chamber to deposit thin-film layers of materials onto the substrate, using a combination of AMAT and CVD ' doping' gases. The process is followed by a rapid annealing step prior to film deposition, which enhances the qualities of the deposited film layer. The reactor is composed of several main components: a main chamber, an upstream chamber, a substrate stage and a gas injection equipment. The main chamber, which is an ultra-high vacuum (UHV) system, contains the substrate stage and ensures high purity during the deposition process. The upstream chamber contains various gas lines and components to support the process, such as injectors and gas lines. The reactor is equipped with high precision controls, allowing the user to regulate the flow of the substrate and dope the gases, ensuring a uniform and high quality deposition. The substrate temperatures are also precisely controlled using quartz sensors, maintained between adjustable ranges of 250° to 400°C. An adjustable reaction chamber pressure is also maintained for optimal process stability. APPLIED MATERIALS Endura 5500 VHP reactor is equipped with safety features to ensure the safety of all persons present in the vicinity. This includes a mechanical door interlock, pressure transducers and escape buttons to ensure that all parts of the unit are working properly. An emergency gas isolation machine and a fire suppression tool also provide added security. The reactor's operation is extremely efficient, enabling the user to achieve high deposition rate, exceptional precision and repeatability, and excellent materials quality. High throughput and full automation capabilities minimize downtime, allowing for greater yield and shorter cycle times. In addition, the reactor is reliable, durable and easy to maintain. Endura 5500 VHP is an ideal choice for the deposition of a range of materials and dielectric films. Its advanced features, including high precision control, safety features, efficiency and durability, have made it a reliable and efficient choice in the CVD industry.
There are no reviews yet