Used AMAT / APPLIED MATERIALS Endura 5500 #166248 for sale
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ID: 166248
Sputtering system, 8"
Process: AlCu / TiN / Ti
Specifications:
Robot:
Buffer: AMAT HP, ceramic blade
Transfer: AMAT HP, metal blade
System monitor:
1: stand alone
2: through the wall
3: stand alone
(1) each monitor rack
Load lock:
Narrow body with tits in and out
No sliding sensor kit
Chamber A
- Chamber type: Pass through
- Chamber Lid: Metal Lid
- Cooling method: NA
Chamber B
- Chamber type: Cool down
- Chamber Lid: Metal lid
- Cooling method: By PCW
Chamber C
- Chamber type: N/A
- Chamber process:
- RF Gen/DC power supply
- Turbo pump:
- Process gas
Chamber D
- Chamber type: Preclean I
- Chamber process:
- RF Gen/DC power supply1:
- RF Gen/DC power supply2:
- Turbo pump
Chamber F:
- Chamber type: Orient/Degas
Chamber 1
- Chamber type: Standard body
- Chamber process: AlCu, Preheat
- Process kit type/items/material: UNKNOWN
- RF Gen/DC power supply1: AE, MDX-10K SLAVE
- RF Gen/DC power supply2: A, MDX-20K MASTER
- Chamber pump: CTI CRYO 8F 2phase
- Source (Lid) type: P/N 0010-20059
- Pedestal type: A101 HEATER, Lifter : P/N 0010-20300
- Process gas: Ar, N2
Chamber 2
- Chamber type: Wide Body
- Chamber process: TiN
- Process kit type/items/material: UNKNOWN
- RF Gen/DC power supply1: AE, MDX-10K MASTER
- RF Gen/DC power supply2: N/A
- Chamber pump: : CTI CRYO 8F 2phase
- Source(Lid) type : P/N 0010-20059
- Pedestal type: A101 HEATER, Lifter : P/N 0010-20300
- Process gas: Ar, N2
Chamber 3
- Chamber type: Wide Body
- Chamber process: Ti
- Process kit type/items/material: UNKNOWN
- RF Gen/DC power supply1: AE, MDX-10K MASTER
- RF Gen/DC power supply2: N/A
- Chamber pump: CTI CRYO 8F 2phase
- Source (Lid) type: P/N 0010-70059
- Pedestal type: A101 HEATER, Lifter : P/N 0010-20300
- Process gas: Ar, N2
Chamber 4
- Chamber type: Wide body
- Chamber process: Ti, Preheat
- Process kit type/items/material: UNKNOWN
- RF Gen/DC power supply1: AE MDX-10K MASTER
- RF Gen/DC power supply2: N/A
- Chamber pump: CTI CRYO 8F 2phase
- Source (Lid) type: P/N 0010-20059
- Pedestal type: A101 HEATER, Lifter : P/N 0010-20300
- Process gas: Ar, N2
Includes:
- Heat exchanger type: Neslab III 1ea
- Compressor type: CTI 8500 2ea
- EMO on source cover : No
- Shutter : No
- SBC : V440
- KSI Shild Treatment DC Power Supply 1ea
- AE, MDX-052, SHILD TREATMENT CONTROLLER
- COMDEL, CPS-1001 RF POWER SOURCE 60.00Hz
- 15V P.S. ASSEMBLY / 24V P.S. ASSEMBLY
Installed
1994 vintage.
AKT/AMAT / APPLIED MATERIALS / AKT Endura 5500 Reactor is a next-generation, plasma etching equipment designed to meet the needs of modern semiconductor device manufacturers. This reactor system is capable of delivering precise etching processes for a wide range of advanced CMOS, 3D NAND and DRAM memories and logic devices. Utilizing a proprietary integrated nozzles combined with a high-density plasma source, AKT Endura 5500 can deliver excellent etch rates, high uniformity across a large wafer area, and quick chamber cycling for increased throughput. AMAT ENDURA 5500 comes with a powerful vacuum pump unit and high motive pressure to facilitate the quick removal of outgassing materials from the process chamber. The machine is equipped with the latest in plasma source and distribution technology, allowing the user to adjust etch parameters in real-time and fine-tune etching results to minimize damage to delicate surfaces during processing. The tool's plastic enclosure is designed to dampen acoustic noise, shielding the asset's precision components from vibration and electromagnetic interference. It also contains an integrated gas delivery model and bulk gas supplies, allowing for the precise delivery and control of multiple etchant gases. APPLIED MATERIALS ENDURA 5500 comes equipped with a configurable workstation and controller, allowing the user to store, recall and adjust etching recipes based on material or product requirements. Additional features include multi-process capability, manual/automated flow control, configurable batch parameters, diagnostics and reporting. AMAT Endura 5500 is designed for clean operation in Class 1 Clean Room environments and is available in multiple configurations for flexible operation, including manual/remote/console operation. This reactor equipment has been manufactured to the highest quality standards, providing reliable and repeatable results. It offers improved yield, throughput and operating economics in a single, flexible platform.
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