Used AMAT / APPLIED MATERIALS Endura 5500 #190624 for sale
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ID: 190624
Wafer Size: 6"
Vintage: 1991
PVD Sputtering system, 6"
Chamber Type: 4 Chamber (1 Standard Body, 3 Wide Body), Pre-Clean 1 Type
Process: Al, Ti, TiN
No missing parts
1 STD-Ti (clamp)
2 Wide-AL (A101)
3 Wide-AL (A101)
4 STD-Ti (clamp)
5 -
A pass
B cool
C PC2
D PC2
E orienter-degas
F orienter-degas
Buffer HP
Xfer HP
LL narrow
Magnet dura and G12
1991 vintage.
AMAT / APPLIED MATERIALS / AKT Endura 5500 is a versatile reactor designed for a wide range of applications in the semiconductor market. It is used in a variety of processes such as chemical vapor deposition (CVD), etching, oxidation, and diffusion. AKT Endura 5500 is a thermal processing equipment with in-situ rapid thermal processing capability and unparalleled temperature uniformity. It has a high temperature range of up to 1700°C (3100°F), making it suitable for a range of advanced semiconductor materials. The reactor is designed with a dual plasma operation capability for improved material deposition process control. This reactor also features ion beam deposition technology for precise deposition uniformity on the wafer. AMAT ENDURA 5500 has a 5.7" wafer capacity and is equipped with two independent heating zones. This allows for better chances of achieving a uniform thermal profile across the wafer. AMAT Endura 5500 is also equipped with a graphite susceptor, which provides excellent thermal management and uniformity. AKT ENDURA 5500 also features automated process control with a computerized system and dedicated, easy-to-use software. This unit provides consistent process performance and faster process time, while its electrostatic chuck wafer holders provide a high level of wafer flatness and excellent uniformity. Other key features of Endura 5500 include a cassette-to-cassette transfer machine and an integrated wafer mapping feature for precise wafer mapping. In addition, the reactor features a conformal coating chamber which provides improved conformal coating quality for low-k materials. APPLIED MATERIALS ENDURA 5500 reactor has an industry-leading, unsurpassed level of temperature control and uniformity that offers optimal process performance for a variety of applications. It is ideal for processing a variety of materials, including advanced materials for next-generation semiconductor devices. Its robust design and leading-edge technology, along with its ease of use, make it a preferred choice for semiconductor applications.
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