Used AMAT / APPLIED MATERIALS Endura 5500 #194704 for sale

Name: AMAT / APPLIED MATERIALS Endura 5500
Brand: AMAT / APPLIED MATERIALS
SKU: 194704
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Reactors

Manufacturer

AMAT / APPLIED MATERIALS

Model

Endura 5500

ID: 194704

Wafer Size: 8"

Vintage: 1993

Sputtering system, 8" Wafer size: 8" flat (not notch) Process: AlCu/ TiN/Ti Configuration: Chamber 1: AlCu Chamber 2: TiN Chamber 3: Ti Chamber 4: Ti Chamber 5: cooling chamber Preheat Etch Clamp (not electrostatic chuck) Robot: Buffer: AMAT HP, ceramic blade Transfer: AMAT HP, metal blade System monitor: 1: stand alone 2: through the wall 3: stand alone Includes (1) each monitor rack Load lock: Narrow body with tilts in/out No sliding sensor kit Chamber A: - Chamber type: Pass through - Chamber Lid: Metal Lid - Cooling method: NA Chamber B: - Chamber type: Cool down - Chamber Lid: Metal lid - Cooling method: By PCW Chamber D: - Chamber type: Preclean I Chamber F: - Chamber type: Orient/Degas Chamber 1: - Chamber type: Standard body - Chamber process: AlCu, Preheat - Process kit type/items/material: UNKNOWN - RF Gen/DC power supply1: AE, MDX-10K SLAVE - RF Gen/DC power supply2: A, MDX-20K MASTER - Chamber pump: CTI CRYO 8F 2phase - Source (Lid) type: P/N 0010-70086 - Pedestal type: A101 HEATER, Lifter : P/N 0010-20300 - Process gas: Ar, N2 Chamber 2: - Chamber type: Wide Body - Chamber process: TiN - Process kit type/items/material: UNKNOWN - RF Gen/DC power supply1: AE, MDX-10K MASTER - RF Gen/DC power supply2: N/A - Chamber pump: : CTI CRYO 8F 2phase - Source(Lid) type : UNIDENTIFIED - Pedestal type: A101 HEATER, Lifter : P/N 0010-20300 - Process gas: Ar, N2 Chamber 3: - Chamber type: Wide Body - Chamber process: Ti - Process kit type/items/material: UNKNOWN - RF Gen/DC power supply1: AE, MDX-10K MASTER - RF Gen/DC power supply2: N/A - Chamber pump: CTI CRYO 8F 2phase - Source (Lid) type: UNIDENTIFIED - Pedestal type: A101 HEATER, Lifter : P/N 0010-20300 - Process gas: Ar, N2 Chamber 4: - Chamber type: Wide body - Chamber process: Ti, Preheat - Process kit type/items/material: UNKNOWN - RF Gen/DC power supply1: AE MDX-10K MASTER - RF Gen/DC power supply2: N/A - Chamber pump: CTI CRYO 8F 2phase - Source (Lid) type: UNIDENTIFIED - Pedestal type: A101 HEATER, Lifter : P/N 0010-20300 - Process gas: Ar, N2 Includes: - Chamber type: Wide body - Chamber process: Ti, Preheat - Process kit type/items/material: UNKNOWN - RF Gen/DC power supply1: AE MDX-10K MASTER - RF Gen/DC power supply2: N/A - Chamber pump: CTI CRYO 8F 2phase - Source (Lid) type: UNIDENTIFIED - Pedestal type: A101 HEATER, Lifter : P/N 0010-20300 - Process gas Installed 1993 vintage.

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AKT /AMAT / APPLIED MATERIALS / AKT Endura 5500 Series Reactor is a state-of-the-art tool for advanced plasma etching and deposition. AKT Endura 5500 is designed to provide superior functionality and accuracy, as well as low cost of ownership and maintenance—all in a compact, easy-to-use system. AMAT ENDURA 5500 offers a comprehensive range of services for both etching and deposition in terms of process flexibility and uniformity over a large range of recipes. Features like the patented Uniformity Control Technology, advanced Ultra High Plasma, and etch-time control allows users to optimize their process to achieve superior performance. ENDURA 5500 also offers an outstanding array of safety and environmental features that make it an ideal choice for both laboratory and production-level operations. The innovative Ultra-Flow process, thermal optimization, and dynamic pressure control protect substrates from exposure to high temperatures and corrosive materials, while ensuring consistent results. The system has an impressive range of tools at its disposal to further enhance its performance and accuracy. Endura 5500 is capable of utilizing special process hardware, such as linear electron beam (LEB) emitters, microwave sources, and ion beam sources, depending on the application. It is also capable of using optimized source materials, source power, and turbulence management features to maximize process repeatability and uniformity. APPLIED MATERIALS Endura 5500's high performance design combined with its ease of use and wide range of safety features make it an ideal choice for a variety of plasma etching and deposition applications. The reactor is highly reliable and energy efficient, delivering consistent results with a low cost of ownership and maintenance. Plus, it comes with a comprehensive package of after-sales support from AMAT, providing users with the peace of mind that their equipment will stay operational for years to come.