Used AMAT / APPLIED MATERIALS Endura 5500 #293752145 for sale
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ID: 293752145
Wafer Size: 8"
Vintage: 2000
PVD System, 8"
Signal cables: 25 M
(1) NESLAB
(2) Cryo compressors 9600
(2) Frequency converters
(2) Gen racks
Turbo Controller
RF and DC generator for Ch1/2/3/4/C/D
System configuration:
SNNF
HP Robot
Ch 1: A101 TiN
Ch 2: STD Al
Ch 3:STD Al
Ch 4: A101 TiN
Ch C: PCII
Ch D: PCII
Chambers:
LL: Widebody universal rotate
CH E: Orient/Degas
CH F: Orient/Degas
CH A: Passthrough with clear lid
CH B: Cooldown with clear lid
CH C: PCII / Comdel 13.56Mhz and RFPP 400kHz
CH D: PCII / Comdel 13.56Mhz and RFPP 400kHz
CH 1: Widebody G12 TiN – No shutter / AE MDX-L 12M-650
CH 2: Standard Body 12.9” Al / (2) AE MDX-L 12M
CH 3: Standard Body 12.9” Al / (2) AE MDX-L 12M
CH 4: Wideobdy G12 TiN – AE MDX-L 12M-650
System controller SBC Board missing
2000 vintage.
AMAT / APPLIED MATERIALS / AKT Endura 5500 is a state-of-the-art reactor designed for advanced semiconductor processing. This reactor is a widely used platform for fabrication of advanced materials through chemical vapor deposition (CVD). AKT Endura 5500 has been designed to provide optimal temperature, pressure and gas control for a wide range of process applications. The 5500 also offers a high throughput and uniform deposition rate, thus enabling higher yields and lower costs. The equipment features a powerful 8-wafer batch box for fast and consistent processing. AMAT ENDURA 5500 was built with a robust hardware and software platform that provides maximum flexibility and repeatability. The hardware includes AMAT Endura 5500 PC-Controlled Process Computer, Process Control Center, and Automated Gassing System. Endura 5500 also offers a wide range of features to ensure high quality processing performance. The unit includes an internal quartz viewport and low-temperature deposition capabilities. The internal viewport allows users to monitor the progress of the process in real time while the low-temperature deposition enables a wide range of deposition materials and temperatures. The machine is also integrated with advanced safety features to ensure safe operation. APPLIED MATERIALS ENDURA 5500 is designed to deliver a range of low-temperature processes including Metal Organic Chemical Vapor Deposition (MOCVD), Low Pressure Chemical Vapor Deposition (LPCVD), High Pressure Chemical Vapor Deposition (HPCVD), Atomic Layer Deposition (ALD), and Plasma Enhanced Chemical Vapor Deposition (PECVD). The tool also offers a variety of temperature control modes including variable temperature deposition (VTD) and constant temperature zone (CTZ). Finally, ENDURA 5500 is a highly reliable and durable reactor asset. This model offers a rugged construction for vibration- and shock-resistant performance, helping to maximize the equipment's uptime and reduce process variations. In addition, AMAT / APPLIED MATERIALS / AKT ENDURA 5500 also boasts a user-friendly interface for easy maintenance. All of these features make APPLIED MATERIALS Endura 5500 an ideal solution for advanced nanofabrication, chip making, and density scaling applications.
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