Used AMAT / APPLIED MATERIALS Endura 5500 #293797288 for sale

AKT-AMAT / APPLIED MATERIALS / AKT Endura 5500 is an advanced plasma-enhanced Chemical Vapor Deposition ("PECVD") reactor. This reactor is designed for fabricating the highest quality thin films for advanced technology device applications. AKT Endura 5500 is a revolutionary tool designed to create thin films with unparalleled uniformity and deposition rate. It utilizes sophisticated system engineering to precisely control and tune plasma parameters, with the goal of optimizing thin film layer characteristics. The reactor is constructed with a heavy duty stainless steel housing to ensure safety and strength. The vessel is filled with a series of vacuum-tight chambers, and is then sealed to maintain a consistent vacuum environment. Inside the vessel, a number of modules, comprising of magnetron cathodes and probes, are used to generate and measure the plasma. AMAT ENDURA 5500 is state of the art, capable of advanced deposition. There are various deposition techniques that can be used, depending on the requirements of the end application. Complete Low Pressure Chemical Vapor Deposition (LP-CVD) and advanced high-rate Atomic Layer Deposition (ALD) are two of the most commonly used. The reactor features a range of process parameter control, with three independent frequency regimes for enhanced control. An intuitive systems control architecture helps to minimize manual processing and experimentation. This suite of advanced process control features can virtually eliminate process instability, increase processing throughput and ensure repeatable, reproducible results. AKT ENDURA 5500 taps into high process temperatures, enabling deposition of films at temperatures up to 500°C with exceptional substrate uniformity. Highly efficient, low-energy gas heating also helps to optimize plasma power efficiency and reduce total cost of ownership. ENDURA 5500 incorporates an advanced, proprietary process control framework with system intelligence and optimization. The user can easily add additional process parameters by dragging and dropping from a software libraries. The reactor offers advanced diagnostics to detect and automatically adjust in flight parameters, as well as various automated processes to ensure that thin films are consistent across an entire substrate. AMAT-AMAT / APPLIED MATERIALS / AKT ENDURA 5500 is the leading choice for thin film deposition for next generation electronics, sensors and integrated photonic applications. With its advanced processes and wide range of functionality, AMAT Endura 5500 delivers superior thin film deposition performance to meet the toughest applications.