Used AMAT / APPLIED MATERIALS Endura 5500 #293829116 for sale
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ID: 293829116
Wafer Size: 8"
Vintage: 1998
Sputtering system, 8"
(2) PVD Endura type remote generator rack
(2) TxZ Gas cabinet
Buffer HP Robot, Transfer robot VHP Robot
AMAT 0 Heat exchanger
AMAT NESLAB III
AC Rack
Umbilical cable length: 25 feet
Chambers:
LLA Load lock A Narrow body with auto tilt
LLB Load lock B Narrow body with auto tilt
E / F Orient / Degas orienter / Standard degas
Clear lid wafer lifter
Cool down clear lid wafer lifter
Buffer HP Robot with metal blade
Transfer VHP Robot with metal blade
IMP Chamber:
Wide body chamber
IMP Source with magnet
Motorized lift assembly
UHV Gate valve (3-Position)
A101 Heater
Shutter assembly
HFV- 8000
MDX - L12 M-650 DC Power supply
HP T x Z Chamber:
Heater lift assembly
Gate valve
HP TxZ Heater
PDX - 900 - 2V
PC II Resonator:
Chamber body
Wafer lift
RF Match
RF CPS1001S
RF LF - 10 A
Missing parts:
9600 System Cryogenics compressor missing
(3) OB-8F Cryogenics pump (3PH) Missing (Buffer, X-fer, IMP)
(4) 361C Turbo pump missing (PC II 2ea, TxZ 2ea)
(4) Resistor on TxZ Lid missing
Operating system: VMS
1998 vintage.
AMAT / APPLIED MATERIALS / AKT Endura 5500 is a high-performance transfer and lithography reactor used for advanced semiconductor applications. AKT Endura 5500 equipment enables rapid and accurate pattern transfer, and supports multiple standard process materials, including doped polysilicon, single- and double-layer polysilicon gate stacks, and hard masks. This system features a large high-precision chamber, fast cooling, and a multi-stage lithography process that ensures accurate pattern replication over the entire wafer surface. AMAT ENDURA 5500 also provides high-end process capabilities, such as deep reactive ion etching (DRIE) and pulsed laser deposition (PLD), enabling the processing of today's ultrathin devices. AKT ENDURA 5500 can hold a variety of substrates, including silicon, gallium arsenide, silicon on insulator, and glass. APPLIED MATERIALS Endura 5500 unit is built with a dual servo-controlled stage mechanism, offering excellent accuracy and repeatability for operation over a wide range of temperatures. It features a three-zone, high-resolution interferometric microscopy (IRM) machine to monitor the entire process. The tool includes a powerful processor, enabling real-time readout of the critical dimensions for a wide range of lithography applications. Furthermore, AMAT Endura 5500 supports thermal annealing for low-temperature processes for improved adhesion of films and structures. APPLIED MATERIALS ENDURA 5500 also includes a unique hot-load/cold-unload feature that significantly reduces exposure to airborne contaminants. This significantly improves device quality and reduces the overall cost of device production. In addition, ENDURA 5500 also features a vacuum chamber with a high-quality, magnetically levitated, motor-driven shutter, allowing for precise shuttering of the reaction chamber for repeatable operations. The combination of high-end lithography capabilities, repeatability, and accuracy makes AMAT / APPLIED MATERIALS / AKT ENDURA 5500 the ideal solution for advanced semiconductor applications. It provides customers with the performance and reliability they need for their most commercially critical processes.
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