Used AMAT / APPLIED MATERIALS Endura 5500 #293829116 for sale

ID: 293829116
Wafer Size: 8"
Vintage: 1998
Sputtering system, 8" (2) PVD Endura type remote generator rack (2) TxZ Gas cabinet Buffer HP Robot, Transfer robot VHP Robot AMAT 0 Heat exchanger AMAT NESLAB III AC Rack Umbilical cable length: 25 feet Chambers: LLA Load lock A Narrow body with auto tilt LLB Load lock B Narrow body with auto tilt E / F Orient / Degas orienter / Standard degas Clear lid wafer lifter Cool down clear lid wafer lifter Buffer HP Robot with metal blade Transfer VHP Robot with metal blade IMP Chamber: Wide body chamber IMP Source with magnet Motorized lift assembly UHV Gate valve (3-Position) A101 Heater Shutter assembly HFV- 8000 MDX - L12 M-650 DC Power supply HP T x Z Chamber: Heater lift assembly Gate valve HP TxZ Heater PDX - 900 - 2V PC II Resonator: Chamber body Wafer lift RF Match RF CPS1001S RF LF - 10 A Missing parts: 9600 System Cryogenics compressor missing (3) OB-8F Cryogenics pump (3PH) Missing (Buffer, X-fer, IMP) (4) 361C Turbo pump missing (PC II 2ea, TxZ 2ea) (4) Resistor on TxZ Lid missing Operating system: VMS 1998 vintage.
AMAT / APPLIED MATERIALS / AKT Endura 5500 is a high-performance transfer and lithography reactor used for advanced semiconductor applications. AKT Endura 5500 equipment enables rapid and accurate pattern transfer, and supports multiple standard process materials, including doped polysilicon, single- and double-layer polysilicon gate stacks, and hard masks. This system features a large high-precision chamber, fast cooling, and a multi-stage lithography process that ensures accurate pattern replication over the entire wafer surface. AMAT ENDURA 5500 also provides high-end process capabilities, such as deep reactive ion etching (DRIE) and pulsed laser deposition (PLD), enabling the processing of today's ultrathin devices. AKT ENDURA 5500 can hold a variety of substrates, including silicon, gallium arsenide, silicon on insulator, and glass. APPLIED MATERIALS Endura 5500 unit is built with a dual servo-controlled stage mechanism, offering excellent accuracy and repeatability for operation over a wide range of temperatures. It features a three-zone, high-resolution interferometric microscopy (IRM) machine to monitor the entire process. The tool includes a powerful processor, enabling real-time readout of the critical dimensions for a wide range of lithography applications. Furthermore, AMAT Endura 5500 supports thermal annealing for low-temperature processes for improved adhesion of films and structures. APPLIED MATERIALS ENDURA 5500 also includes a unique hot-load/cold-unload feature that significantly reduces exposure to airborne contaminants. This significantly improves device quality and reduces the overall cost of device production. In addition, ENDURA 5500 also features a vacuum chamber with a high-quality, magnetically levitated, motor-driven shutter, allowing for precise shuttering of the reaction chamber for repeatable operations. The combination of high-end lithography capabilities, repeatability, and accuracy makes AMAT / APPLIED MATERIALS / AKT ENDURA 5500 the ideal solution for advanced semiconductor applications. It provides customers with the performance and reliability they need for their most commercially critical processes.
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