Used AMAT / APPLIED MATERIALS Endura 5500 #9004064 for sale

Name: AMAT / APPLIED MATERIALS Endura 5500
Brand: AMAT / APPLIED MATERIALS
SKU: 9004064
Availability: SoldOut

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Reactors

Manufacturer

AMAT / APPLIED MATERIALS

Model

Endura 5500

ID: 9004064

Wafer Size: 8"

HP PVD system, 8" Wafer type: notch Buffer robot type: HP Transfer robot type: HP Buffer robot blade: metal Wafer sensors: cassette Loadlock type: Narrow body with tilt Fab installation: TTW Transfer robot blade: metal Software revision E8.86 Signal tower: Red-amber-green System umbilicals: 50 ft standard EMO's: momentary Loadlock slit valve O rings: Viton (black) No heat exchangers Hard drive: 5 Gb Chamber 2: PVD wide body Process 2: PVD sputter Susceptor / pedestal: 101 Process kit type: other Manometer config: Single Lid type: 11.3 Wall cooling: None Manometer 1: 100mTorr Throttle valve: none Heater / cathode cooling: other Pump configuration: Cryo Manometer 2: None RF gen / DC supply: AE MDX-L6 Endpoint system: No Turbo pump: No Slit valve oring: Viton black Heated valve stack: No Chamber orings: Viton brown RF match: None Chamber lid clamps: yes Magnet number: 0010-20328 Chamber gases: Gas 1 50sccm Nitrogen, STEC 4400 MC mtl seal, MFC18, Standard gas stick configuration Gas 2 140sccm Argon, STEC 4400 MC mtl seal, MFC19, Standard gas stick configuration Gas valves: Nupro Chamber 3: PVD wide body Process 3: PVD sputter Susceptor / pedestal: 101 Process kit type: other Manometer config: Single Lid type: 11.3 Wall cooling: other Manometer 1: 100mTorr Throttle valve: none Heater / cathode cooling: other Pump configuration: Cryo Manometer 2: None RF gen / DC supply: AE MDX-L6 Endpoint system: No Turbo pump: No Slit valve oring: Viton black Heated valve stack: No Chamber orings: Viton brown RF match: None Chamber lid clamps: yes Magnet number: 0010-20328 Chamber gases: Gas 1 140sccm Argon, STEC 4400 MC mtl seal, MFC2, Standard gas stick configuration Gas 2 100sccm Nitrogen, STEC 4400 MC mtl seal, MFC3, Standard gas stick configuration Gas valves: Nupro Chamber 4: PVD wide body Process 4: PVD sputter Susceptor / pedestal: 101 Process kit type: other Manometer config: Single Lid type: 11.3 Wall cooling: other Manometer 1: 100mTorr Throttle valve: none Heater / cathode cooling: other Pump configuration: Cryo Manometer 2: None RF gen / DC supply: AE MDX-L6 Endpoint system: No Turbo pump: No Slit valve oring: Viton black Heated valve stack: No Chamber orings: Viton brown RF match: other Chamber lid clamps: yes Magnet number: 0010-01198 Chamber gases: Gas 1 140sccm Argon, STEC 4400 MC mtl seal, MFC5, Standard gas stick configuration Gas 2 50sccm Nitrogen, STEC 4400 MC mtl seal, MFC6, Standard gas stick configuration Gas valves: Nupro Chamber A: Pass through Gas valves: Nupro Slit valve oring: Viton black Chamber orings: Viton black Chamber B: Cooldown Gas valves: Nupro Slit valve oring: Viton brown Manometer: None Heater / cathode cooling: PCW Chamber pump: Edwards Chamber orings: Viton black No turbo pump Chamber E: Orienter / Degas Chamber F: Orienter / Degas AC Rack damaged during transport 1995 vintage.

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AKT/AMAT / APPLIED MATERIALS / AKT Endura 5500 is a critical tool used in the fabrication of semiconductor components and systems. It is primarily used to create high-endurance, low-power parts and devices that meet a variety of industry standards. AKT Endura 5500 offers increased performance and reliability compared to many other tools on the market, making it an ideal choice for many wafer fabrication processes. AMAT ENDURA 5500 is a single-chamber, horizontal reactor that can handle multiple wafer sizes. It is designed for fast, high-precision plasma etching and deposition processes. The equipment uses a gas injection nozzle at the bottom of the chamber, designed to increase etching speed and efficiency. The turret of AMAT Endura 5500 is equipped with combination load lock and gas injection ports, allowing for faster, low-cost loading and unloading compared to manual operations. The system has a few different modes of operation, including a "coil-to-wafer" mode which enables repeatable process cycles and improved throughput. APPLIED MATERIALS Endura 5500 is equipped with a high-grade quartz chamber and lid designed for vacuum integrity. This chamber enables high-precision deposition and etch processes with low particle levels, while covering a wide range of pressures and temperatures. The unit is also built with a powerful programmable controller, which includes both automatic and manual control modes to handle all parts of the wafer fabrication process. ENDURA 5500 also features an advanced wafer cleaning machine designed to further improve yield. It utilizes a special power-driven brush that rotates at high speeds, efficiently removing any particles from the wafer's surface. The tool also includes a real-time particle monitor that responds quickly to ensure safe wafer cleaning and burn-in process control. AMAT / APPLIED MATERIALS / AKT ENDURA 5500 is an extremely reliable tool for sub-micron precision fabrication of the most advanced semiconductor devices. It provides high-quality performance in high-throughput, single-wafer processes, making it an economical choice for wafer fabrication operations. The asset is built with high-endurance, low-power components that can ensure precise and accurate operation for many years.