Used AMAT / APPLIED MATERIALS Endura 5500 #9064236 for sale
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ID: 9064236
System, 8"
Process CH. 3: AL, CH. D: PC2(Oxide Etch )
Software version Unknown
Wafer Shape SNNF
Wafer Cassette 8”PEEK Miraial
SMIF Interface None
Heat exchanger: none
Chamber A COOL(STANDARD COOLDOWN CHAMBER)
Chamber B COOL(STANDARD COOLDOWN CHAMBER)
Chamber D PC2(Cryo Type)
Chamber E Orienter(ORIENTER WITH STANDARD DEGAS)
Chamber F Orienter(ORIENTER WITH STANDARD DEGAS)
Chamber 3 AL(Wide Body)
Transfer:
Load LockA/B Type Narrow automated tilt out
Transfer Robot Type HP+
Transfer Robot Blade Metal
Buffer Robot Type HP+
Buffer Robot Blade Metal
Buffer Cryo Type BROOKS 8116071G001
Transfer Cryo Type BROOKS 8116071G001
Chamber D:
Process Type Oxide Etch
Chamber Body Cryo Type(AMJ：0020-23249)
Pedestal Parts No. AMJ ：0010-20754
Lift Assy Parts No. AMJ ：0010-20753
Power Supply (kw) AMJ ：0190-70099
Gas Pallet Configuration:
N2 MFC size 20sccm(SEC-4400MC)
N2 MFC size 300sccm(SEC-4400MC)
Chamber 3:
Process Type AL
Chamber Body Wide Body(AMJ：0040-20195)
Source Type Standard
Target Type Unknown
Magnet Type AMJ ：0010-20225(Mechanical Fail)
Magnet Shim Size 0.5MM
Lift Assy Parts No. 0010-70271
Heater Parts No. 0010-12516
Power Supply (kw) MDX-L12M-650(AMJ ：0190-21110)
Power Supply (kw) MDX-L12M-650(AMJ ：0190-21110)
Cryo Gate Valve Type 3Positon
Cryo Pump Type Enhanced(8116071G001)
Gas Pallet Configuration:
N2 MFC size 20sccm(SEC-4400MC)
N2 MFC size 100sccm(SEC-4400MC)
Cryo compressors:
(1) BROOOKS 8510, gas: He (99.999%pure)
(1) BROOOKS 8500, P/N: 8031348G001, gas: He (99.999%pure)
2000 vintage.
AMAT / APPLIED MATERIALS / AKT Endura 5500 is a advanced, top-of-the-line vertical thermal reactor capable of performing high-temperature annealing, oxidation, and nitridation processes on a variety of materials, most commonly used in the semiconductor and MEMS industries. This reactor features a unique dual-head design that can process two substrates concurrently and incorporates a built-in vacuum pump. AKT Endura 5500 is equipped with state-of-the-art heating elements and a robust, digital temperature control equipment that ensures precise, uniform thermal processing. The control system also allows for smooth ramping and step and dwell heating profiles for a wide range of temperature regimes and allows for the integration of additional heating elements for higher temperatures. AMAT ENDURA 5500 also features an intuitive graphical user interface for ease of use, a built-in interlock unit that ensures safety protocols, and a variety of configurable parameters for each specific application. The design of APPLIED MATERIALS Endura 5500 incorporates a durable stainless steel construction with easy access to replaceable components and multiple gas inlets for purge and reaction gas introduction. The reactor is also outfitted with a 90-inch viewing window and optional viewing camera as well as a mechanical lift and weights/belt machine to facilitate loading and unloading. APPLIED MATERIALS ENDURA 5500 is able to process wafers and substrates up to 6 inches in diameter, is capable of processing substrates of varying thicknesses including standard and ultra-thin substrates, and has a maximum process temperature of 1100°C. This superior reactor also offers excellent thermal uniformity, repeatability, and flexibility in substrate configuration, making AKT ENDURA 5500 ideal for a variety of high-temperature annealing, oxidation, and nitridation processes.
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