Used AMAT / APPLIED MATERIALS Endura 5500 #9117504 for sale

AKT/AMAT / APPLIED MATERIALS / AKT Endura 5500 is a advanced chemical vapour deposition (CVD) reactor designed for high performance semiconductor and flat panel display applications. It is a single-wafer, atmospheric pressure, cassette-to-cassette solution that offers highly advanced, process-adaptable technology for exceptional chamber performance and superior wafer uniformity. This innovative CVD reactor provides exceptional process uniformity, extremely low cycle time, and high throughput across a wide range of process chemistries, while maintaining excellent chamber characteristics. AKT Endura 5500 delivers consistently high quality thin films that meet demanding process requirements. The end-to-end process control and capability ensure superior wafer quality and pinhole-free films. The system also provides superior process division flexibility with Dynamic Gas Re-balance, which actively adjusts the laser performance of the CVD reactor to maximize wafer uniformity within a cassettes, accross multiple cassettes, and beyond. This system provides improved process consistently with a wider range of substrate materials such as glass, silicon and quartz. The automated and user customizable, recipe-driven, control software allows for extremely precise chamber control, optimized operation, reduction of cycle time and improved yield. Automated Purge and Clean™ routine features allows for quick and repeatable processing cycles. AMAT ENDURA 5500 reactor also features advanced motion control technologies, such as scanless control to minimize time and uniformity variations, as well as superior wafer transport to reduce cycle time and yields of repeatable processes. Last, but not least, the system enables Faster Wafer Changeover™ (FWC™) and Improved Laser Reflection™ (ILR™) which enhances reliability and uptime of the reactor by significantly improving wafer changeover performance and providing a virtual cleanroom-like atmosphere. Overall, AMAT/AKT ENDURA 5500 CVD reactor provides the highest performance, highest quality, repeatable processes suitable for a wide range of substrates. It is the most advanced CVD reactor available today, perfect for high-performance, precision semiconductor and flat panel display applications.