Used AMAT / APPLIED MATERIALS Endura 5500 #9142619 for sale

AMAT / APPLIED MATERIALS / AKT Endura 5500 is a high performance epi-ready reactor designed for semiconductor fabrication. This powerful reactor utilizes advanced plasma enhanced chemical vapor deposition (PECVD) technology to deposit thin films at elevated temperatures for a variety of applications. With its high-density plasma source, AKT Endura 5500 delivers feature-rich films with superior uniformity, uniformity within a wafer, and excellent film thickness control. AMAT ENDURA 5500 features a 25.4" by 25.4" continuous zone quartz process chamber with a large inner diameter of 20.1" and an industry-leading indexing table supporting up to 1000W power. The chamber has a slim total depth of only 43" to maximize floor space usage. With its large etch zone, AMAT / APPLIED MATERIALS / AKT ENDURA 5500 can perform oxide etching single wafer as well as linear etching for up to eight batch substrates. The high-speed wafer shuttle enables uniform heating of wafers in a batch environment and supports a wide range of substrate sizes. The reactor's RF power coupling system is specifically designed for superior matching of the plasma source to the process chamber and offers high stability and smooth performance. AKT ENDURA 5500 also offers a wide window of process parameters ranging from low to high frequency, pressure, nitrogen flow rate power, and power level. The optional high-density plasma source allows for better integration of high-level deposition processes with single wafer films. With its patent pending "Centuri" system, Endura 5500 offers unparalleled uniformity within a single wafer batch. This system dynamically allocates process gas to each wafer for unparalleled uniformity and repeatability. The reactor also features a two zone setpoint control which allows for variable flows for different applications and substrate sizes. APPLIED MATERIALS Endura 5500 also offers an optional automated substrate edge pallet that helps reduce film deposition on substrates edges. The advanced control software on ENDURA 5500 provides precise process control, including real-time data and log collection. This software also features a unique GasBox control module that can automatically adjust gas cascade settings to achieve optimum film thickness and uniformity. AMAT Endura 5500 also includes features such as wafer uniformity mapping and advanced diagnostic libraries which allow for rapid optimization of process results. Overall, APPLIED MATERIALS ENDURA 5500 is a reliable, high-performance reactor perfect for semiconductor fabrication processes. Equipped with the latest technologies, this powerful reactor offers uniformity, precision, and repeatability for all of your deposition, etching, and nitride needs.