Used AMAT / APPLIED MATERIALS Endura 5500 #9145241 for sale

AMAT / APPLIED MATERIALS / AKT Endura 5500 is a high performance reactor designed for advanced deposition and etching applications. Specifically, AKT Endura 5500 enables both thin film and thick film deposition processes, as well as challenging etch processes, in both thermal and plasma-enhanced deposition and etching applications. The reactor is designed for both CVD and PECVD process steps for applications including silicon, titanium nitride, gallium arsenide, tungsten, and aluminum. AMAT ENDURA 5500 reactor is an open-frame designed for advanced deposition and etching process needs. This open-frame design allows greater accessibility to the inner workings of the system, allowing for easier maintenance and faster system reconfiguration. Its flexible architecture provides system integration capabilities, with a variety of interchangeable component systems that can be easily interchanged to accommodate different needs. ENDURA 5500 boasts several thermal capabilities, including RF, Helicon inductively coupled plasma (ICP), direct current (DC), and pulsed DC bias modes. Its adjustable process parameters range from the process pressure, source gas pulse residence time, andRF power. It also features a patented Z-axis wafer carriage, which can accommodate up to 12 wafers simultaneously, allowing for increased uniformity and more efficient processing. This design also allows for easy isolation of deposition and etch steps. AMAT Endura 5500 has proven itself to be a dependable systemboasting a wide range of features that offer users complete control of their process conditions. It also features an intuitive user interface that provides users with real-time process monitoring, trending capabilities, and predictive analyses to ensure process optimization.These features give users the flexibility to dial-in their own custom settings and optimize their process performance. Although it is more expensive than comparable systems, AMAT / APPLIED MATERIALS / AKT ENDURA 5500 offers true scalability and can accommodate a wide range of needs, from high throughput production runs to more specialized process steps, making it an attractive option that many semiconductor and nanotechnology-oriented organizations and universities choose to invest in.