Used AMAT / APPLIED MATERIALS Endura 5500 #9182838 for sale

AMAT / APPLIED MATERIALS / AKT Endura 5500 is a multi-station chemical vapor deposition (CVD) reactor designed for the production of uniform semiconductor films. AKT Endura 5500 utilizes advanced design principles to ensure uniformity and reproducibility of film deposition. It utilizes two independent process stations, one for deposition and one for etching, enabling users to quickly process wafers with multiple steps in a single tool. Each process station is composed of a "process chamber envelope" and a set of process modules. The process chamber envelope consists of components including the gas distribution manifold, the process tube, and the vacuum chamber. These components control gas flow and pressure, gas homogeneity and uniformity, and system cleanliness. AMAT ENDURA 5500 utilizes high-performance tubes, swirlers, pumps, and dampers that are specifically designed to ensure uniform deposition of thin films. The system is designed to minimize chemical interaction with the subliming material, absorbing and dissipating the heat generated in the process into the surrounding area. It also helps to reduce the risk of particulate contamination. ENDURA 5500 is highly customizable and offers a variety of features designed to enable precise control over the substrate temperature, process gases, and pressure levels. It also includes a variety of optional accessories such as a hot-wall heating block, gas delivery manifold, and etching showerhead to optimize the deposition process for specific applications. The environment inside the chamber is highly controlled during the deposition process, as all process parameters are precisely monitored and controlled through the tool's XRH software. This enables the film quality to be consistently and uniformly maintained. APPLIED MATERIALS ENDURA 5500 is designed for minimal maintenance and optimal longevity. It can be fully serviced on site and is easily upgradable. Additionally, its uniformity is highly respected in the industry and it provides high throughput and cost-effectiveness. It is an excellent choice for semiconductor manufacturers and research facilities who require reliable and advanced CVD technology.