Used AMAT / APPLIED MATERIALS Endura 5500 #9191119 for sale

AMAT / APPLIED MATERIALS / AKT Endura 5500 is an ultra-high vacuum, single-wafer planetary reactor for advanced semiconductor processing applications. With a production-class equipment architecture, AKT Endura 5500 reactor can be deployed in 300mm or larger fabs and enables the deposition of advanced materials into nanometers of precision. AMAT ENDURA 5500 reactor comes with a pre-aligned, Dual-Gimbaled Rotating and Stationary Head with an integrated Quartz Viewing Window that facilitates operator access and provides an unobstructed view throughout the entire run. This enables continuous monitoring of the wafer during the processing run, allowing for monitoring of deposition rate and target thickness. Due to the integrated Quartz Viewing Window, the system can be used for either single-wafer or batch-mode processing of both metal and dielectric films. APPLIED MATERIALS Endura 5500 reactor is equipped with advanced robotics and multiple carrier configurations that facilitate both easy integration and scalability, enabling a wide variety of process applications. It features a high-speed robot with a low-friction track unit, which offers smooth operation, efficient throughput, and precise control throughout the process. This allows for comprehensive recipe testing and optimization in a single production environment. ENDURA 5500 reactor is also compatible with multiple gas distribution systems, which provide flexibility and expandability for advanced process applications. An integrated vacuum machine with variable diffusion pump pressures and tuning valves maintains process stability and uniformity while accommodating both continuous and pulsed gas introduction. This provides unprecedented control over process subtleties such as gas/source composition, gas flow rates, film thickness, and liner profiles. Endura 5500 reactor is capable of performing a wide range of deposition processes. It can be used for high-precision film deposition for nano-structures, doped-gate formation for next-generation transistors, and ultra-smooth film deposition for wafer passivation. The reactor is also suitable for advanced memory device architectures such as NAND Flash and DRAM. Additionally, it supports barrier and passivation films, adhesion layers, ultra-thin gate oxides, back-end dielectrics, diffusion barrier/etch-stop layers, and source/drain extensions. With its robust automation, high precision, and low-cost of ownership, AMAT / APPLIED MATERIALS / AKT ENDURA 5500 reactor meets the most critical and demanding requirements of today's advanced semiconductor processing applications.