Used AMAT / APPLIED MATERIALS Endura 5500 #9193019 for sale

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ID: 9193019
Wafer Size: 8"
Vintage: 2000
PVD System, 8" Wafer shape: SNNF Chamber type / Location: Ch-1 Copper SIP ENCORE CU Ch-2 Refractory SIP ENCORE TA(N) Ch-3 Refractory SIP ENCORE TA(N) Cb-4 Copper SIP ENCORE CU Ch-A Pass thru Ch-B Cooldown with temp monitor Ch-C Reactive preclean Ch-D Reactive preclean Ch-E Orientor ultra uniform O/D with temp feedback Ch-F Orientor ultra uniform O/D with temp feedback System safety equipment: System EMO Type: Turn to release ETI compliant Includes EMO button guard ring Primary side trip amperage: 3P 600VAC 300 AINTCHG Trip unit Circuit breaker on secondary: 600A System water leak detector Mainframe facility water flow Electrical requirement: Line frequency: 60 Hz Line voltage: 480V Transformer type: 480V; 225kVA Main AC power inlet hole: Small 2000 vintage.
AMAT / APPLIED MATERIALS / AKT Endura 5500 is an advanced chemical vapor deposition (CVD) reactor designed for use in a variety of applications such as semiconductor device fabrication, flat panel display manufacturing, and specialized research areas. The reactor is equipped with two static PE-CVD chambers and two dynamic sputter coating chambers. Each chamber is individually addressed to improve processing flexibility and allow for multiple process combinations in one system. The PE-CVD chambers deliver exceptional film uniformity and layer repeatability with ultra-low substrate to substrate variance. The chambers are equipped with a Process Monitoring Module which ensures reliable and consistent growth of high performance films without the need for frequent manual adjustments or calibrations. The included vacuum pumps provide a base pressure below 10mTorr and ensures a clean, low contamination working environment while the included gas cabinet interface enables continued robustness and reproducibility. The dynamic sputter chambers provide a significantly higher deposition rate, reducing sputter times compared to conventional sputter coating. Additional flexibility is available with the ability to vary the power level during a coating cycle. The high source power also allows higher rates of deposition on certain components. The included E-beam gun emits electrons, rather than ions, and creates positive coating growth rates that will not damage the substrate. In addition to the chambers, AKT Endura 5500 includes a PC control module with a graphical user interface. This module enables remote access, making operation and programming relatively straightforward. The touchscreen control panel provides operators with all the necessary control parameters and allows for fine-tuning of the settings without having to open the reactor. Additionally, it also features a number of diagnostic functions to assist with troubleshooting and optimize the reactor settings. AMAT ENDURA 5500 is a reliable, repeatable, and cost effective solution when processing critical substrates and substrates requiring non-uniformity critical processing. The multi-chamber capabilities increase versatility of the system and provide superior uniformity and long-term repeatability. It is the perfect solution for high-performance, low-cost applications.
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