Used AMAT / APPLIED MATERIALS Endura 5500 #9193019 for sale
It looks like this item has already been sold. Check similar products below or contact us and our experienced team will find it for you.
Tap to zoom
Sold
ID: 9193019
Wafer Size: 8"
Vintage: 2000
PVD System, 8"
Wafer shape: SNNF
Chamber type / Location:
Ch-1 Copper SIP ENCORE CU
Ch-2 Refractory SIP ENCORE TA(N)
Ch-3 Refractory SIP ENCORE TA(N)
Cb-4 Copper SIP ENCORE CU
Ch-A Pass thru
Ch-B Cooldown with temp monitor
Ch-C Reactive preclean
Ch-D Reactive preclean
Ch-E Orientor ultra uniform O/D with temp feedback
Ch-F Orientor ultra uniform O/D with temp feedback
System safety equipment:
System EMO Type: Turn to release ETI compliant
Includes EMO button guard ring
Primary side trip amperage: 3P 600VAC 300 AINTCHG Trip unit
Circuit breaker on secondary: 600A
System water leak detector
Mainframe facility water flow
Electrical requirement:
Line frequency: 60 Hz
Line voltage: 480V
Transformer type: 480V; 225kVA
Main AC power inlet hole: Small
2000 vintage.
AMAT / APPLIED MATERIALS / AKT Endura 5500 is an advanced chemical vapor deposition (CVD) reactor designed for use in a variety of applications such as semiconductor device fabrication, flat panel display manufacturing, and specialized research areas. The reactor is equipped with two static PE-CVD chambers and two dynamic sputter coating chambers. Each chamber is individually addressed to improve processing flexibility and allow for multiple process combinations in one system. The PE-CVD chambers deliver exceptional film uniformity and layer repeatability with ultra-low substrate to substrate variance. The chambers are equipped with a Process Monitoring Module which ensures reliable and consistent growth of high performance films without the need for frequent manual adjustments or calibrations. The included vacuum pumps provide a base pressure below 10mTorr and ensures a clean, low contamination working environment while the included gas cabinet interface enables continued robustness and reproducibility. The dynamic sputter chambers provide a significantly higher deposition rate, reducing sputter times compared to conventional sputter coating. Additional flexibility is available with the ability to vary the power level during a coating cycle. The high source power also allows higher rates of deposition on certain components. The included E-beam gun emits electrons, rather than ions, and creates positive coating growth rates that will not damage the substrate. In addition to the chambers, AKT Endura 5500 includes a PC control module with a graphical user interface. This module enables remote access, making operation and programming relatively straightforward. The touchscreen control panel provides operators with all the necessary control parameters and allows for fine-tuning of the settings without having to open the reactor. Additionally, it also features a number of diagnostic functions to assist with troubleshooting and optimize the reactor settings. AMAT ENDURA 5500 is a reliable, repeatable, and cost effective solution when processing critical substrates and substrates requiring non-uniformity critical processing. The multi-chamber capabilities increase versatility of the system and provide superior uniformity and long-term repeatability. It is the perfect solution for high-performance, low-cost applications.
There are no reviews yet