Used AMAT / APPLIED MATERIALS Endura 5500 #9203801 for sale

AMAT / APPLIED MATERIALS / AKT Endura 5500 Reactor is a state-of-the-art etch and deposition process reactor used in the semiconductor and micro-electronics industries. This reactor is designed for the highest level of stability to produce the highest quality results in the industry. Its basic configuration includes a chamber, a pumping/process gas manifold, a power supply, and a loader/ unloader subsystem. All of these systems are enclosed in a robust housing that is flame retardant and also sound attenuated, allowing for the highest safety standards and performance to be achieved. The chamber has uniform vertical and radial sidewall induced gas/plasma uniformity, uniform process gas distribution,excellent reactor cleanability, and superior optical access. It does not require a plasma source to acheive the highest performance, and is durable enough to withstand thermal shocks. The pumping/process gas manifold provides control of and pressure for input process gases and for manifold cleaning and maintenance. It has a minimum ten-fold pressure differential across the chamber for process functionality, as well as optimal repeatability. The power supply for the reactor can generate high intensity capacitively coupled plasma (CCP) or Inductively Coupled Plasma (ICP) for etching. The power has six independent outputs and is capable of delivering high plasma energy density, optimal uniformity and repeatability, and uniform etch profiles with post-etch cleaning. The loader/ unloader subsystem allows for efficient processing of substrates and wafers. It features a single pass loader/ unloader, allowing wafers to be loaded/ unloaded quickly and efficiently. The system also offers precise wafer and substrate handling with its tight mechanical tolerances. AKT Endura 5500 Reactor is the ideal option for engineering a clean, repeatable, and uniform deposition or etch process. It is capable of producing ultra-high precision processes for the highest quality of results with minimal waste. Its state-of-the-art design ensures maximum efficiencies of materials and longevity of performance in the semiconductor and micro-electronics industries.