Used AMAT / APPLIED MATERIALS Endura 5500 #9208048 for sale
It looks like this item has already been sold. Check similar products below or contact us and our experienced team will find it for you.
Tap to zoom
Sold
ID: 9208048
Vintage: 2002
PVD System, 8"
Single board computer in controller: V452
Copper barrier / Seed
Wafer handling: SNNF
Front panel type: Light pen
Loadlock vents: Variable speed
Buffer / Transfer robot: HP
Blade material: Thin metal
Chamber A: Bypass
Chamber B: Cool
Chamber E: Degas
Chamber F: Degas
Chamber C: Pre clean
Vacuum pump type: Turbo/dry
RF Match: PVD 200
Cable length: 50 Feet
Pedestal type: Cylinder
Power supply 1: CPS-1001S
Power supply 2: RFPP LF10A
Chamber 1 / 2:
Body style: WB
Source type: VECTRA IMP
Power supply: MXD-L12M 12KW
Heater: B101
Dual TC amp kit: No
Pedestal: B101
Target: D-Bond
Magnet: RH-2
Magnet shim thx: 0.75 mm
Gasline fittings: VCR
Loadlock fittings: VCR
Process MFC-1: 1 Ar 100
Process MFC-2: 1 Ar 100
Paste chamber: No
System roughing pump type: Dry
Chamber cryo pump type: CTI OB-8F, 3 phase
Heat exchangers: 1000
Cryo compressors: 9600 X2
Umbilicals:
Mainframe to controller: 75 Feet
Mainframe to generator racks: 75 Feet
Mainframe to cryo compressor: 75 Feet
Main AC to system controller/sys AC: 75 Feet
System AC to primary generator rack: 50 Feet
Main AC to primary generator rack: 6 Feet
Main AC to pump frame: 50 Feet
Main AC to NESLAB heat exchanger: 50 Feet
Monitor cable: 50 Feet
2002 vintage.
AKT/AMAT / APPLIED MATERIALS / AKT Endura 5500 is a next-generation plasma-enhanced chemical vapor deposition (PECVD) reactor designed to provide reliable, high-performance performance deposition for wide range of thin-film applications in semiconductor device fabrication. The equipment utilizes advanced plasma technology to produce high-quality, uniform thin films with superior process control. AKT Endura 5500 reactor comes equipped with a compact, easily-serviceable design, and is well-suited for high-throughput manufacturing operations. The system allows users to set process parameters independently for each chamber, providing precise control and uniformity over the entire process. This ensures that thin film deposition is uniform and consistent, yielding high-quality results. AMAT ENDURA 5500 also utilizes a range of sophisticated plasma and gas-phase technologies to optimise process performance and enhance process reliability. By providing uniform deposition in a very consistent environment, the unit can produce thicker, thinner and multi-layer films with precise control and predictable results. Furthermore, AMAT / APPLIED MATERIALS / AKT ENDURA 5500 allows for excellent process control through its advanced integrated process monitoring, diagnostics and process optimization capabilities. Additionally, AMAT Endura 5500 also provides enhanced safety and reliability. The machine utilizes intelligent sensors to constantly monitor both plasma and temperature conditions. This provides real-time feedback on the status of the tool, allowing operators to quickly identify and address any potential performance issues. Overall, AMAT/Endura 5500 provides an easy-to-use, reliable, and efficient solution for the thin-film deposition needs of semiconductor device fabrication. With its advanced plasma technology and integrated process monitoring and optimization capabilities, APPLIED MATERIALS ENDURA 5500 provides reliable, uniform and precise deposition results that are perfect for high-volume production.
There are no reviews yet