Used AMAT / APPLIED MATERIALS Endura 5500 #9219406 for sale

Name: AMAT / APPLIED MATERIALS Endura 5500
Brand: AMAT / APPLIED MATERIALS
SKU: 9219406
Availability: SoldOut

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Reactors

Manufacturer

AMAT / APPLIED MATERIALS

Model

Endura 5500

ID: 9219406

Wafer Size: 8"

Vintage: 2001

System, 8" Wafer shape: SNNF MF Facilities: Bottom Chamber 1: STD WC Body Process 1: ESC AL Chamber 2: Wide body Process 2: TTN Chamber 3: Wide body Process 3: TTN Chamber 4: Wide body Process 4: Ti Chamber A: Pass through Chamber B: Cooldown Chamber C/D: PCII Process C/D: Oxide etch Chamber F: O/D With temp Heat exchanger 1: NESLAB I Loadlock pump type: iL600 Transfer robot type: HP+ Transfer robot blade: Metal Buffer robot type: HP+ Buffer robot blade: Metal Wafer sensor: Mini beam Loadlock type: Narrow BD without tilt out System umbilical: 50 ft EMOs: Turn to release Hard drive: SCSI (2) CRTs GEM: No OTF: No No Facility power (UPS) No loadlock pump Loadlock slit valve O-rings: Viton (Black) Heat exchanger 1: NESLAB Heat exchanger 2: M-Pack Main AC box: 480 V, Wide type Chamber A: Chamber type: Pass through Chamber lid: STD Lid Lift hoop & finger Pedestal type: Standard Chamber B: Chamber type: Cooldown Gas valves: Fujakin Heater / Cathode cooling: PCW Chamber lid: STD Lid Pedestal type: Standard without TC option Chamber C: Chamber type: PCII Manometer config: Single Manometer 1: 100mTorr No shutter option Chamber process: Oxide etch Lid type: RF Resonator RF Gen / DC supply 1: COMDEL CPS-1001S RF Gen / DC supply 2: RFPP LF10A RF Match: 13.56 MHz No endpoint system Process kit type: PIK-I Chamber pump: EDWARD iL70 Turbo pump: LEYBOLD No heated valve stack Gas MFC Size MFC Type MFC Number Gas stick N2 20 SCCM STEC 4400 MFC9 (2) Manifolds N2 300 SCCM MC-3102E-NC MFC10 (2) Manifolds Chamber D: Chamber type: PCII Manometer config: Single Manometer 1: 100mTorr No shutter option Chamber process: Oxide etch Lid type: RF Resonator RF Gen / DC supply 1: COMDEL CPS-1001S RF Gen / DC supply 2: RFPP LF10A RF Match: 13.56 MHz No endpoint system Process kit type: PIK-I Chamber pump: EDWARD iL70 No heated valve stack Gas MFC Size MFC Type MFC Number Gas stick N2 20 SCCM STEC 4400 MFC12 (2) Manifolds N2 300 SCCM MC-3102E-NC MFC13 (2) Manifolds Chamber 1: Chamber type: STD WC Body Manometer config: Single Manometer 1: 100mTorr No shutter option Chamber process: ESC AL Lid type: 12.9" RF Gen / DC Supply 1/2: AE MDX-L12M Susceptor / Pedestal: MCA ESC Heater / Cathode cooling: NESELAB I No endpoint system Gate valve position: 3 POS Process kit type: ESC AL Chamber pump: Cryo pump (OB8F-3 Phase) No heated valve stack Gas MFC Size MFC Type MFC Number Gas stick N2 100 SCCM STEC 4400 MFC18 (2) Manifolds N2 20 SCCM STEC 4400 MFC9 (2) Manifolds Chamber 2: Chamber type: Wide body Manometer config: Single Manometer 1: 100mTorr No shutter option Chamber process: TTN Lid type: 12.9" RF Gen / DC Supply 1: AE MDX-L12M Susceptor / Pedestal: 101 No endpoint system Gate valve position: 3 Pos Process kit type: (2) Ti/TiN Chamber pump: Cryo pump (OB8F-3 Phase) No heated valve stack Gas MFC Size MFC Type MFC Number Gas stick N2 300 SCCM STEC 7440 MFC9 (2) Manifolds N2 100 SCCM STEC 4400 MFC10 (2) Manifolds Chamber 3: Chamber type: Wide body Manometer config: Single Manometer 1: 100mTorr No shutter option Chamber process: TTN Lid type: 12.9" RF Gen / DC Supply 1: AE MDX-L12M Susceptor / Pedestal: 101 No endpoint system Gate valve position: 3 Pos Process kit type: (2) Ti/TiN Chamber pump: Cryo pump (OB8F-3 Phase) No heated valve stack Gas MFC Size MFC Type MFC Number Gas stick N2 100 SCCM STEC 4400 MFC2 (2) Manifolds N2 300 SCCM STEC 4400 MFC3 (2) Manifolds Chamber 4: Chamber type: Wide body Manometer config: Single Manometer 1: 100mTorr No shutter option Chamber process: TTN Lid type: 12.9" RF Gen / DC Supply 1: AE MDX-L12M Susceptor / Pedestal: MCA ESC Heater / Cathode cooling: NESELAB I No endpoint system Gate valve position: 3 Pos Process kit type: ESCAL Chamber pump: Cryo pump (OB8F-3 Phase) No heated valve stack Gas MFC Size MFC Type MFC Number Gas stick N2 20 SCCM STEC 4400 MFC4 Single N2 100 SCCM STEC 4400 MFC5 (2) Manifolds N2 200 SCCM STEC 4400 MFC6 (2) Manifolds Missing ES chuck System power: 200 VAC, 60 Hz, 3 phase, 343 A,150 kVA 2001 vintage.

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AKT (AMAT) AMAT / APPLIED MATERIALS / AKT Endura 5500 is a high-performance, stand-alone reactor designed for the production of advanced semiconductors. AKT Endura 5500 is capable of achieving high throughput and low defect rates for a wide variety of substrates and materials. The equipment is powered by a scalable, modular architecture that supports the most advanced semiconductor processes and fabrication techniques. AMAT ENDURA 5500 is equipped with a variety of unique features that ensure optimal productivity. It has a high-performance wafer handling system that allows wafers to be loaded quickly and easily. APPLIED MATERIALS Endura 5500 also features an automated wafer mapping unit which ensures uniformity of wafer processing. Additionally, the machine has an advanced process control tool that continuously monitors process temperatures and other critical parameters. AMAT Endura 5500 is designed to provide superior production reliability for high volume production. It features an advanced cooling asset that ensures efficient operation and minimizes downtime. Additionally, Endura 5500 is designed with environmental safeguards such as air exhaust filtration, vacuum control, and temperature moderation. This ensures safe operation in both production and laboratory environments. In terms of aesthetics, ENDURA 5500 features an attractive, sleek design. The model is designed to be self-contained, and it has an intuitive user interface that is easy to learn and use. The equipment also has a range of optional features, such as an advanced scanner for analyzing wafers, that can be added to further enhance its performance. In addition to its impressive performance and aesthetics, APPLIED MATERIALS ENDURA 5500 offers a range of productivity enhancing features. It is designed for high throughput and low defect rates and can accommodate a variety of optical, wafer, and process requirements. Additionally, the system's advanced control unit provides detailed data about process parameters, enabling users to adjust the process as needed. AKT ENDURA 5500 is an exceptionally reliable reactor that offers users a high degree of process flexibility. It is the ideal solution for high volume semiconductor production applications and is well-suited for both laboratory and production environments.