Used AMAT / APPLIED MATERIALS Endura 5500 #9221707 for sale

Name: AMAT / APPLIED MATERIALS Endura 5500
Brand: AMAT / APPLIED MATERIALS
SKU: 9221707
Availability: SoldOut

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Photo Used AMAT / APPLIED MATERIALS Endura 5500 For Sale

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Reactors

Manufacturer

AMAT / APPLIED MATERIALS

Model

Endura 5500

ID: 9221707

Vintage: 1993

PVD System Chambers: (4) PVD chambers (2 TiN and 2 Al) (2) Degas chambers (1) Preclean chamber CTI-CRYOGENICS / HELIX TECHNOLOGY 0120-60-4887 CTI-CRYOGENICS Roughing Valve 8112579G001 CTI-CRYOGENICS On-Board 8F Cryopump 8116142G001 CTI-CRYOGENICS Roughing Valve 8112579G001 CTI-CRYOGENICS On-Board 8F Cryopump 8116027G001 CTI-CRYOGENICS / HELIX TECHNOLOGY 0120-60-4887 CTI-CRYOGENICS SPLTR Box Tool 8135240G001 MKS Type 627 Pressure Transducer MKS Type 627 Pressure Transducer MKS Type 627 Pressure Transducer CTI-CRYOGENICS Roughing Valve 8112579G001 CTI-CRYOGENICS SPLTR Box Tool 8135240G001 CTI-CRYOGENICS On-Board FastRegen Sputtering Control CTI-CRYOGENICS On-Board 8F Cryopump 8116027G001 CTI-CRYOGENICS Roughing Valve 8112579G001 CTI-CRYOGENICS Valve 8112095 CTI-CRYOGENICS On-Board 8F Cryopump 8116027G001 CTI-CRYOGENICS On-Board FastRegen Sputtering Control MKS Type 627 Pressure Transducer Endura Wafer Lift Assembly 101 Rev. 003 0010-70271 8" Preclean II RF Match 0010-20524 (Label PN 0060-21140) Endura Wafer Lift Assembly Preclean 2 Rev. 003, 21902-08 MKS Type 627 Pressure Transducer 0010-20277 8" Degas Lamp 350C 0010-20317 8" Degas Lamp 350C 0010-20317 CTI-CRYOGENICS On-Board Module 8113100G001 CTI-CRYOGENICS Roughing Valve 8112579G001 Gas Box #1 0010-20217 Rev. B CTI-CRYOGENICS / HELIX TECHNOLOGY 0120-60-4887 CTI-CRYOGENICS On-Board 8F Cryopump 8116142G001 Loadlock A (11) Loadlock B (0620-01049) Operator Control Panel BD Assy. 0100-20032 Rev. D ViewSonic E55 Monitor VCDTS21914-2M Standalone VGA Monitor Base 0010-70386 Rev. A Gas Box #2 0010-20218 Rev. B Gen Rack #1 ADVANCED ENERGY MDX-L12M ADVANCED ENERGY MDX-L12-650 ADVANCED ENERGY MDX-L12M-650 Gen Rack #2 ADVANCED ENERGY MDX-L12M ADVANCED ENERGY MDX-L12M Gen Rack #3 ADVANCED ENERGY LF10A COMDEL RF Power Source CPS-1001S GRANVILLE-PHILLIPS Ionization Gauge Supply 332102 15V PS Assembly 24V PS Assembly CTI-CRYOGENICS On-Board 3PH MTR Control 8124063G001 CPRSR High Perf Model 9600 3620-01389 Rev. A CTI-CRYOGENICS On-Board 3PH MTR Control 8124063G001 Thornton 200CR CTI-CRYOGENICS 9600 Compressor 8135917G001 CTI-CRYOGENICS 9600 Compressor 8135909G001 NESLAB BOM # 327099991701 EBARA A30W EBARA A70W HARMONIC GEAR UGH50-28 VEXTA 5-Phase Stepping Motor A4249-9215HG VEXTA 5-Phase Stepping Motor A4249-9215HG-A1 GEORG FISCHER V 82 Supply voltage: 480 VAC, 3 phase, 50/60 Hz Max system rating: 150 kW Largest load ampere rating: 42 A Interrupt current: 10,000 Amps IC 1993 vintage.

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AMAT / APPLIED MATERIALS / AKT Endura 5500 is a large-area plasma processing equipment designed for the semiconductor manufacturing industry. This system can be used to treat a variety of wafers, including silicon and sapphire, by plasma etching and deposition. It can also be used for a wide range of other purposes such as barrier layers, oxide layers, and thin film stacks. AKT Endura 5500 is a freestanding, fully-integrated unit that contains a process chamber, gas cabinets and process control modules. This allows for independent control of multiple functions including pressure, gas and power settings, making it possible to accurately tailor the process to specific applications. The machine also includes multiple shielding materials to protect users from the high voltages and temperatures present in the tool's environment. The asset is designed to control the process chamber's temperature, power, and gas flow to a high degree of accuracy. The power levels range from 300W to 5000W, which allows for a wide range of process settings. The chamber temperature is maintained between 1033 C and 1133C, while the pressure can range from 0.002 torr to 760 torr. Additionally, the chamber's flow rate can range from 0.18 liters/minute to 15 liters/minute. AMAT ENDURA 5500 also provides real-time in situ analysis with its Ion and Neutral Particle Mass Spectrometer (IPMS). This allows the operator to monitor the plasma environment and enables precise control of the process. Additionally, the model has an improved process control module that provides enhanced equipment diagnostics and process optimization. Furthermore, AKT ENDURA 5500 provides enhanced safety features, including a fault detection system and a protective gas envelope to contain any spillover. This ensures the safety of personnel and the integrity of the process. ENDURA 5500 is an efficient thermal processing unit designed to enable precise process control and repeatability. It is the ideal choice for fabrication and integration of advanced semiconductor devices. It provides a robust, cost-effective solution for processes such as etching and deposition of silicon wafers. With its real-time in situ analysis and its range of settings, the machine is ideal for a variety of applications.