Used AMAT / APPLIED MATERIALS Endura 5500 #9241774 for sale
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ID: 9241774
Wafer Size: 8"
Vintage: 2000
MOCVD System, 8"
Wafer shape: SNNF
MF Facilities: Bottom
Load lock type: Narrow BD without tilt out
CTI-CRYOGENICS Buffer chamber
CTI-CRYOGENICS Transfer chamber
No SMIF interface
Mainframe:
Buffer robot type: HP+
Wafer sensor: Mini beam
Buffer robot blade: Metal
Transfer robot type: HP+
Transfer robot blade: Metal
Hard Disk Drive (HDD): SCSI
(2) CRT Monitors
Chamber 1:
Type: IMP Vectra
Process 1: Ti
Susceptor / Pedestal: B101
Process kit type: IMP
Single manometer configuration
Lid type: G12
Chamber pump: 3P Onboard 8F
Manometer 1: 100 mTorr
Heater / Cathode cooling: NESLAB II
CTI-CRYOGENICS Cryo pump
LEYBOLD Turbotronik NT 150/360 Turbo controller
(2) RF Generators / DC Supplies
ADVANCED ENERGY MDX-L12M
ADVANCED ENERGY HFV-8000
ADVANCED ENERGY CX-600S
RF Match: 13.56 MHz, 2 MHz
Shutter option
Gate valve position: 3-Position
2 MHz Matching box capacitor: 0.01uF
Chamber 2:
Chamber type: TxZ HP+
Process 2: CVD TiN
Susceptor / Pedestal: HP+
Dual manometer
Wall cooling: AMAT1
Chamber pump: AA70W
Manometer 1: 10 Torr
Manometer 2: 100 Torr
No endpoint system
Throttle valve
Heater / Cathode cooling: PCW
ADVANCED ENERGY PDX 900-2V RF Generator / DC Supply
LEYBOLD 361C Turbo pump
LEYBOLD Turbotronik NT 150/360 Turbo controller
EBARA AA70W Pump
Gate valve position: 2-Positions
Chamber 3:
Chamber type: TxZ HP+
Chamber process: CVD TiN
Pump configuration: 361C
Susceptor / Pedestal: HP+
Dual manometer
Wall cooling: AMAT1
Chamber pump: AA70W
Manometer 1: 10 Torr
Manometer 2: 100 Torr
Throttle valve
Heater / Cathode cooling: PCW
ADVANCED ENERGY PDX 900-2V RF Generator / DC Supply
LEYBOLD 361C Turbo pump
EBARA AA70W Pump
Gate valve position: 2-Positions
No endpoint system
Chamber A:
Chamber type: Pass through
Chamber lid: Clear lid
Chamber B:
Chamber type: Cool down
Heater / Cathode cooling: PCW
Chamber lid: Clear lid
Chamber D:
Chamber type: PCII
Chamber process: Oxide etch
Single manometer
Lid type: Resonator
EDWARDS iL600N Chamber pump
Manometer 1: 100 m Torr
COMDEL CPS 1001S RF Generator / DC Supply
LEYBOLD Turbovac 361C Turbo pump
LEYBOLD Turbotronik NT 150/360 Turbo controller
EBARA iL70 Pump
RFPP LF10A RF Generator / DC Supply
RF Match: 13.56 MHz
COMDEL CPS-1001S
RFPP LF-10A
Module:
AMAT / APPLIED MATERIALS System controller
(2) AMAT / APPLIED MATERIALS Generator racks
AMAT / APPLIED MATERIALS Main AC box
NESLAB
AMAT / APPLIED MATERIALS Heat exchanger
CTI-CRYOGENICS 9600 Compressor
CTI-CRYOGENICS 3P Motor controller
EDWARDS iL600N Pump
Controllers:
Slot / Top rack board
1 / SBC Board
2 / Videl board
3 / OMS Board
4 / Digital input / Output board 1
5 / Digital input / Output board 2
6 / Digital input / Output board 3
7 / Digital input / Output board 4
8 / Digital input / Output board 5
9 / Digital input / Output board 6
10 / SEI Board
13 / Digital input / Output board 7 (Option)
14 / AO Board 1 (Option)
15 / Stepper board 1
18 / Stepper board 2
19 / AI Board
20 / AO Board 2
21 / AO Board 3
22 / Hard Disk Drive (HDD)
23 / Grounding JAC
24 / Convectron board
25 / Convectron board
26 / Convectron board
27 / Convectron board
28 / TC
29 / TC
30 / ION Gauge board 1
31 / ION Gauge board 2
32 / Spare
33 / Digital input / Output board 8
34 / Digital input / Output board 9
35 / Digital input / Output board 10
37 / Digital input / Output board 12
39 / Digital input / Output board 14
40 / Floppy disk
42 / Cryo temp
43 / AI Mux
44 / AI Mux
45 / AI Mux
47 / Opto detect board 1
48 / Opto detect board 2
49 / Opto detect board 3
Power supply: 200 VAC, 60 Hz, 3 Phase, 343 A, 150 kVA
2000 vintage.
AMAT / APPLIED MATERIALS / AKT Endura 5500 is an innovative, automated chemical vapor deposition (CVD) thin-film coating reactor designed for advanced semiconductor, solar, optoelectronic and other applications. With a process chamber volume of 5500 liters and a hotwall reactor design, AKT Endura 5500 reactor offers a high-thermal efficiency and reliability, thanks to an extensive active cooling equipment. The reactor is based on AKT patented hotwall process, enabling optimal growth conditions for a wide variety of thin-film materials. AMAT ENDURA 5500 utilizes patented liners that allow wafers to be loaded directly into the chamber without introducing externally generated particles to the process. These liners are designed to minimize or eliminate pockets and thinning of the wafers due to field crowding. Additionally, the included a scrubber strip maintains the highest process purity within the chamber. Additionally, APPLIED MATERIALS ENDURA 5500 includes an on-board measurement chamber to optimize process control and deliver optimal film attributes. AKT ENDURA 5500 uses an innovative uniform-injector excitation system and a patented multipoint excitation pattern to eliminate shadowing effects, achieve uniformity over larger wafer sizes, and provide a uniform plasma for efficient and uniform film growth. The hotwall design of the reactor works to create an ideal working environment for advanced materials, yielding superior film characteristics, even for high temperatures. Motorized carrier loading and end-station robots are designed to support high-volume throughput. The fully automated unit provides a load-lock chamber, a human machine interface (HMI) for simplified control, temperature control and real-time monitoring during operation. In summary, AMAT Endura 5500 is a reliable and efficient CVD reactor designed for process fluid control and production. Featuring a 5500-liter process chamber and external scrubber liners, this hotwall machine is ideal for growing thin-film materials and creating optimal thin-film characteristics. The uniform-injector excitation tool, multipoint excitation patterns, and motorized carrier loading capabilities provide a highly efficient and reliable asset for radio frequency-based thin-film deposition.
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