Used AMAT / APPLIED MATERIALS Endura 5500 #9241831 for sale

Name: AMAT / APPLIED MATERIALS Endura 5500
Brand: AMAT / APPLIED MATERIALS
SKU: 9241831
Availability: SoldOut

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Reactors

Manufacturer

AMAT / APPLIED MATERIALS

Model

Endura 5500

ID: 9241831

Wafer Size: 6"

Vintage: 2000

System, 6" Load lock chamber: LLC Type: Narrow body Indexer without rotation Wafer mapping CH Vent: Slow / Fast vent No wafer slide out detector Buffer chamber: Robot unit: HP Blade type: Metal Upper & lower motor (2) Gate valves Cryo pump: 3 Phase (7) Wafer sensors Transfer chamber: Robot unit: HP Blade type: Metal Upper & lower motor (2) Gate valves Cryo pump: 3 Phase (6) Wafer sensors Chamber A: Pass through Chamber B: Cool down Chamber A / B: Lid type: Clear plastic Wafer lift Wafer lift hoop No TC monitor Chamber E / F: Oreintor degas Degas lamp module Wafer lift Wafer lift hoop Wafer chuck Orientor controller PCB Laser tub missing Laser CCD array PCB No TC No TC amp Chamber 1: PVD Wide body Source assy: 11.3" Source bracket kit Coh ti adaptor plate Wafer lift: Clamp Heater: Clamp Heater water box: Clamp Manometer: MKS 100 mT Ar Backside (2) Gate valves Ion gauge Shutter option Cryo pump: 3 Phase Heater type: Clamp Chamber harness Chamber inter-connect PCB Chamber process gas line Chamber vent line Chamber source water manifold Chamber pneumatic 1/8 poly line set Chamber 2: PVD Wide body Source assy, 11.3" Source bracket kit Adaptor plate: WB to STD 13" Wafer lift: Clamp Heater: Clamp Heater water box: Clamp Manometer: MKS 100 mT Ar Backside (2) Gate valves Ion gauge Shutter option Cryo pump: 3 Phase Heater type: Clamp Chamber harness Chamber inter-connect PCB Chamber process gas line Chamber vent line Chamber source water manifold Chamber pneumatic: 1/8 Poly line set Chamber 3 / 4: PVD Wide body Source assy: 11.3" Source bracket kit Adaptor plate: WB to STD 13" Wafer lift: Clamp Heater: Clamp Heater water box: Clamp Manometer: MKS 100 mT Convectron gauge Ar Backside (3) Gate valves: PVD Ion gauge Shutter option Cryo pump: 3 Phase Heater type Chamber harness Chamber inter-connect PCB Chamber process gas line Chamber vent line Chamber source water manifold Chamber pneumatic: 1/8 Poly line set Chamber C: PCII Etch Resonator Pedestal lift MKS Manometer Convectron gauge Ion gauge Turbo pump Wafer lift RF Match No process kit Chamber 1,2,3,4 & C: Gas panel assy MFC: (STEC 4400) MFC Down steam valve Manual shut off valve MFC Control cable MFC Inter-connect PCB Sub-module: Cryo compressor: CTI 9600 & 8500 (2) Cryo controllers: 3 Phase Chiller: NESLAB III Vacuum pump System pump: BOC EDWARDS QDP40 PCII Pump: BOC EDWARDS QDP40 + MB250 System rack: VEM SBC Video SEI (12) DIO AI (2) AO (3) Opto PCB (2) AI Mux Cryo temp /AI MUX (4) Steppers PCB TC Gauge PCB (2) Ion gauge PCB (4) Invertron gauge PCB OMS PCB Hard disk FD Disk (4) 2-Phase HTR lift drivers (6) 5-Phase robot drives RF Rack: RF/DC Rack Turbo controller (5) ISO AMP (4) DC/RF Generator interlocks PCB DC Power supply DC Generator: Model ADVANCE ENERGY MDX-L series RF Generator CPS 1001 RF Generator RFPPLF10A AC Rack type: 480 VAC, 3 Phase, 4+1 Wire with transformer DC Power supply: +5 VDC / +24 VDC DC Power supply: +/-15 VDC / +/-12 VDC 2000 vintage.

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AMAT / APPLIED MATERIALS / AKT Endura 5500 is a gas-essential, in-situ etch reactor for use in semiconductor processing and tooling applications. It is designed to provide optimal uniformity and reliability for etching applications using a combination of inert or reactive gases and an optimized substrate-to-antenna design. AKT Endura 5500 features a dual-substrate capable reactor, with both a lower chamber and an upper chamber. The lower chamber is optimized for high-speed etch and deposition processes, while the upper chamber offers a larger process window for etch and deposition processes requiring more precise control. AMAT ENDURA 5500 is equipped with a low-noise, low-power, actively cooled plasma to enable reliable operation for a wide variety of etch and deposition processes. The built-in dynamic pressure control allows for adjustment of RF power to maintain optimal process uniformity and reliability. APPLIED MATERIALS Endura 5500 utilizes an ultrasonic frequency-conversion technology to ensure uniform heating of the substrate, and uniform etching of polymers and other organic material. The broadband capability of APPLIED MATERIALS ENDURA 5500 reactor enables users to maximize throughput and utilization of their tools while simultaneously optimizing their performance. AMAT / APPLIED MATERIALS / AKT ENDURA 5500 also features a variety of advanced process monitoring systems, including optical emission spectroscopy, thermal imaging, and optical microscopy analysis. With AKT ENDURA 5500, users are able to monitor critical process parameters in real time and make adjustments as needed, enabling better process control and optimization. The system is easy to use, highly accurate, and offers a wide range of programmability for direct control and monitoring of all major process parameters. For safe and reliable operation, AMAT Endura 5500 also includes a built-in safety system, with safety interlocks and protective hardware in order to protect operators and equipment from unexpected hazards. It includes a variety of motion and thermal control systems, allowing users to configure it to their specific needs. Endura 5500 also offers an automated maintenance system to make sure that it is kept in top shape and ready for optimal etching and deposition operations.