Used AMAT / APPLIED MATERIALS Endura 5500 #9257162 for sale

Name: AMAT / APPLIED MATERIALS Endura 5500
Brand: AMAT / APPLIED MATERIALS
SKU: 9257162
Availability: SoldOut

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Reactors

Manufacturer

AMAT / APPLIED MATERIALS

Model

Endura 5500

ID: 9257162

Sputtering system, 6" Load lock chamber: LLC Type: Narrow body Indexer without rotation Wafer mapping CH Vent: Slow / Fast vent No wafer slide out detector Buffer chamber: AGILENT / HP / HEWLETT-PACKARD Robot Upper and lower motors (2) Gate valves Cryo pump: 3 Phase (7) Wafer sensors Transfer chamber: AGILENT / HP / HEWLETT-PACKARD Robot Upper and lower motors (2) Gate valves Cryo pump: 3 Phase (6) Wafer sensors Chamber A: Pass through Chamber B: Cool down Chamber A / B: Lid type: Clear plastic Wafer lift Wafer lift hoop No TC monitor Chamber E / F: Orienter degas Degas lamp module Wafer lift Wafer lift hoop Wafer chuck Orienter controller PCB Laser CCD array PCB No TC No TC amp Chamber 1: PVD Wide body Source assy: 11.3" Source bracket kit COH TI Adapter plate Wafer lift: Clamp Heater: Clamp Heater water box: Clamp MKS 100 mT Manometer Ar Backside (2) Gate valves Ion gauge Shutter option Cryo pump, 3 Phase Heater type: Clamp Chamber harness Chamber inter-connect PCB Chamber process gas line Chamber vent line Chamber source water manifold Chamber pneumatic 1/8 poly line set Chamber 2: PVD Wide body Source assy, 11.3" Source bracket kit Adapter plate: WB to STD 13" Wafer lift: Clamp Heater: Clamp Heater water box: Clamp MKS 100 mT Manometer Ar Backside (2) Gate valves Ion gauge Shutter option Cryo pump: 3 Phase Chamber harness Chamber inter-connect PCB Chamber process gas line Chamber vent line Chamber source water manifold Chamber pneumatic: 1/8 Poly line set Chamber 3 / 4: PVD Wide body Source assy: 11.3" Source bracket kit Adapter plate: WB to STD 13" Wafer lift: Clamp Heater: Clamp Heater water box: Clamp MKS 100 mT Manometer Convectron gauge Ar Backside (3) Gate valves: PVD Ion gauge Shutter option Heater type Chamber harness Chamber inter-connect PCB Chamber process gas line Chamber vent line Chamber source water manifold Chamber pneumatic: 1/8 Poly line set Chamber C: PCII Etch Resonator Pedestal lift MKS Manometer Convectron gauge Ion gauge Turbo pump Wafer lift RF Match No process kit Chamber 1, 2, 3, 4, C: Gas panel assy MFC: STEC 4400 MFC Down steam valve Manual shut off valve MFC Control cable MFC Inter-connect PCB Sub-module: CTI-CRYOGENICS 9600 Cryo compressor (2) Cryo controllers: 3 Phase NESLAB III Chiller Vacuum pump System pump: BOC EDWARDS QDP40 PCII Pump: BOC EDWARDS QDP40 + MB250 System rack: VEM SBC SEI (12) DIO AI (2) AO (3) Opto PCB (2) AI MUX Cryo temp / AI MUX (4) Steppers PCB TC Gauge PCB (2) Ion gauges PCB (4) Invertron gauges PCB OMS PCB Hard Disk Drive (HDD) Floppy Disk Drive (FDD) (4) HTR Lift drivers, 2-Phase (6) Robot drives, 5-Phase RF Rack: RF / DC Rack (5) ISO Amp (4) DC / RF Generator interlocks PCB DC Power supply ADVANCED ENERGY MDX-L12 DC Generator CPS 1001 RF Generator RFPPLF10A RF Generator Missing parts: Metal blades Laser tubes Heater type: Clamp Cryo pump, 3 Phase Turbo controller RF / DC Rack ADVANCED ENERGY MDX-L Series DC Generator RF Generator, 13.56 MHz / 400 kHz Power supply: AC Rack type: 480 VAC, 3 Phase, 4+1 Wire with transformer DC Power supply: +5 VDC / +24 VDC DC Power supply: +/-15 VDC / +/-12 VDC 2000 vintage.

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AMAT / APPLIED MATERIALS / AKT Endura 5500 is a semiconductor based high-density plasma reactor for Wet Etching. This reactor is designed to provide superior uniformity in production and engineering of advanced integrated circuits. It offers a wide range of plasma resource options, as well as state-of-the-art process control and monitoring capabilities. AKT Endura 5500 action system is designed to reduce process deviation, while providing improved performance and yield. AMAT ENDURA 5500 is designed as having gallium nitride (GaN) etch processes. It features a diode-pumped pulsed-plasma source module, process control module, and etch module. The pulsed-plasma source is a high-pressure, high-efficiency device which enables fine control of plasma parameters for improved etching performance. The process control module offers flexibility for various production requirements. It is capable of controlling multi-number of gas lines and delivery valves, as well as easy real-time switching of multiple etch parameters, such as: gas pressure, platen voltage, etch time, platen voltage bias, chamber temperature, and others. The etch module is designed to offer flexibility, acceleration of etch process, and uniformity of etch patterns. It features a replicable platen design to reduce potential process deviation, while also enabling specific platen designs for special etch processes. AKT ENDURA 5500 is a highly reliable reactor with low maintenance requirements. It is capable of achieving low defect rate, while maintaining high product yields. The reactor is designed for ease of use, with intuitive user-interface, and easy, step-by-step process support. It provides process engineers and production personnel with valuable feedback on the process results, which enables faster cycle-times and improved yield. This reactor is also designed for long-term stability and repeatability of process parameters for production and engineering. Overall, AMAT Endura 5500 is a highly advanced, reliable, and easy-to-use high-density plasma reactor for Wet Etching. It is designed to provide improved process control, uniform etch patterns, and improved product yields. It enables easier, faster, and repeatable processes, while also providing engineers and production personnel with valuable feedback on the process results.