Used AMAT / APPLIED MATERIALS Endura 5500 #9274513 for sale

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ID: 9274513
Wafer Size: 8"
Vintage: 2000
PVD System, 8" (4) Process chambers (2) AL Chambers (2) Ti/TiN Chambers (2) Degas orientor chambers Signal tower System power supply Control unit CTI-CRYOGENICS Cryo-compressor Cryo-pump Main frame: Load lock type: Narrow Buffer robot type: HP+ Buffer robot blade Transfer robot type: HP+ Transfer robot blade Components: System controller Generator rack Main AC Cryo compressor NESLAB Heat exchanger Chamber A: Process type: PASS Chamber B: Process type: COOL Chamber E: Process type: Orientor Chamber F: Process type: Orientor Chamber 1: Process type: Hot-AL Chamber body: Standard Source lid Magnet: 0010-20225 Heater / Pedestal: A101 HTR Shutter Cryo / Turbo pump Gate valve MDX-L12 RF / DC Generator Chamber 2: Process type: TIN Chamber body: Wide Source lid Magnet: 0010-20225 Heater / Pedestal Cryo / Turbo pump Gate valve MDX-L12M RF / DC Generator Chamber 3: Process type: TIN Chamber body: Wide Source lid Heater / Pedestal Cryo / Turbo pump Gate valve MDX-L18M RF / DC Generator Chamber 4: Process type: Hot-AL Chamber body: Standard Souece lid Magnet: 0010-20225 Heater / Pedestal: A101 HTR Shutter Cryo / Turbo pump Gate valve MDX-L6 RF / DC Generator Missing parts: Chamber 3: Magnet Massflow 2000 vintage.
AMAT / APPLIED MATERIALS / AKT Endura 5500 is a high-throughput plasma etch reactor that is commonly utilized in the semiconductor industry for critical processes such as substrate etching. The 5500 is engineered to provide superior process control with excellent uniformity across the entire substrate area. The rugged design of this reactor enables the use of multiple chambers equipped with a wide variety of process gases to actually achieve the desired results. It is designed to operate in a pressure range up to 1 Torr (1.33 kPa) with no leakage and is equipped with an advanced source power matching equipment that allows unlimited plasma matching, ensuring the highest uniformity levels across the etch area. AKT Endura 5500 is powered by its automated control system, maximizing throughput and productivity on demanding etching applications. The process monitoring and control systems are capable of controlling a variety of process parameters including gas delivery, pressure, flow, dopant/source deposition, and etch speed. As well, its low-pressure operation minimizes particle generation, improving process yields and device uniformity. AKT Endura unit also contains an advanced co-sputter and third generation lipping technologies which provide high-precision masking and target control. These allow you to precisely control the profiles of etched layers on all types of materials. This gives users the ability to precisely control etch profiles, ensuring the features of critical wafers are uniform and well defined. AMAT ENDURA 5500 is engineered for high process reliability, yielding a benefit in fewer maintenance sessions, which optimizes production lifetime. It is equipped with a remote, inter-locked maintenance capability, which enables users to perform maintenance or calibration tasks without interrupting the process. Also, the machine is designed with a mechanical and thermal imaging tool which helps to detect hidden damage that may not be visible to the naked eye, alerting the operator when there is a risk of electrical shorting. As an advanced etching asset, ENDURA 5500 is designed with safety in mind. Its three-level safety model design, certified by SEMI S2, eliminates the need for an emergency stop switch. As a result, the risk of dangerous, uncontrolled pressure losses is eliminated. APPLIED MATERIALS ENDURA 5500 equipment from AMAT provides a powerful tool for the fabrication of complex components that require precision and high quality (Ulta-High-K etch in the semiconductor industry). With its rugged design, superior process control capabilities, and safety systems, this plasma etch reactor is a powerful production asset that will help you achieve the highest quality results.
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