Used AMAT / APPLIED MATERIALS Endura 5500 #9304004 for sale

Name: AMAT / APPLIED MATERIALS Endura 5500
Brand: AMAT / APPLIED MATERIALS
SKU: 9304004
Availability: InStock

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Photo Used AMAT / APPLIED MATERIALS Endura 5500 For Sale

Reactors

Manufacturer

AMAT / APPLIED MATERIALS

Model

Endura 5500

ID: 9304004

Wafer Size: 6"

Vintage: 1997

System, 6" MF Facilities: Rear Heat exchanger: NESLAB I Buffer robot type: HP Transfer robot type: HP Hard Disk Drive (HDD): SCSI Buff robot blade: Ceramic Wafer sensor: Mini beam Loadlock type: Narrow body without tilt out Transfer robot blade: Metal Signal tower: 3 Color System umbilicals: 25 ft EMO No GEM No OTF Controller Generator rack (2) CTI-CRYOGENICS 9600 Compressors CTI-CRYOGENICS Motor controller: 3 Phase EBARA A07V Pump Main AC box Transformer: 200 VAC,3 Phase, 50/60 Hz MF Enclousure cover installed MF Gas box Laser assy OB- 8F Cryo pump: Enhanced type Process lift: Motorize type SBC BD Type: V452 Buffer / Transfer: VHP Conversion possible type MF Facility box UPS: Interface type Chamber A: Type: PC-II ADVANCED ENERGY LF10A RF Generator COMDEL CPS1001S RF Generator Gas valves: Nupro Manometer: 100m Torr LEYBOLD Turbovac 361C Pump Lid: Resonator Match box, 6" LEYBOLD Turbotronic 150 / 360 Turbo controller EBARA A07V Pump Gasses: LEYBOLD Turbo pump MFC Size / Gas name / MFC Type 300 / Ar / Stec 4400 20 / Ar / Stec 4400 Chamber B: Type: Cool down Gas valves: Nupro Heater / Cathode cooling: PCW Lid modified to Quartz lid Chamber 1: Process: TTN Type: STD Body Manometer configuration: Single Manometer: 100m Torr No shutter option Lid type: 11.3" ADVANCED ENERGY MDX-L12-650 DC Power supply Susceptor / Pedestal: 101 3-Position gate valve OB-8F Pump: 3 Phase Ion gauge: Nude type Lift type: Basic motorize type Gasses: Gas / MFC Size / Gas name / MFC Type / Qty / Gas stick configuration Gas 1 / 200 SCCM / N2 / Stec 4400 / (2) / Manifolds Gas 2 / 100 SCCM / Ar / Stec 4400 / (2) / Manifolds Gas 3 / 200 SCCM / N2 / Stec 4400 / (2) / Manifolds Chamber 2: Process: AL Type: STD Body Manometer configuration: Single Manometer: 100m Torr No shutter option Lid type: 11.3" ADVANCED ENERGY MDX-L12M Power supply ADVANCED ENERGY MDX-L12 Power supply Susceptor / Pedestal: 4F Heater / Cathode cooling: NESLAB I 3-Position gate valve OB-8F Pump: 3 Phase MKS Residual gas analyzer installed Lift type: Basic motorize type Gasses: Gas / MFC Size / Gas name / MFC Type / Gas stick configuration Gas 1 / 100 SCCM / Ar / Stec 4400 / Standard Gas 2 / 100 SCCM / Ar / Stec 4400 / Standard Chamber 3: Process: Ti Type: STD Body Manometer configuration: Single Manometer: 100m Torr No shutter option Lid type: 11.3" ADVANCED ENERGY MDX-10K DC Power supply Susceptor / Pedestal: 101 3-Position gate valve OB-8F Pump: 3 Phase Lift type: Basic motorize type Gasses: Gas / MFC Size / Gas name / MFC Type / Qty / Gas stick configuration Gas 1 / 200 SCCM / N2 / Stec 4400 / (2) / Manifolds Gas 2 / 100 SCCM / Ar / Stec 4400 / (2) / Manifolds Gas 3 / 200 SCCM / N2 / Stec 4400 / (2) / Manifolds Chamber 4: Process: TTN Type: STD Body Manometer configuration: Single Manometer: 100m Torr No shutter option Lid type: 11.3" ADVANCED ENERGY MDX-650 HiZ DC Power supply Susceptor / Pedestal: 101 3-Position gate valve OB-8F Pump: 3 Phase Lift type: Basic motorize type Gasses: Gas / MFC Size / Gas name / MFC Type / Qty / Gas stick configuration Gas 1 / 200 SCCM / N2 / Stec 4400 / (2) / Manifolds Gas 2 / 100 SCCM / Ar / Stec 4400 / (2) / Manifolds Gas 3 / 20 SCCM / Ar / Stec 4400 / (2) / Manifolds Missing parts for chamber 1: Drive: 2 Phase Motor Gear box Gear box mount Belt Slot / Top rack boards: 1 / SBC Board 2 / Videl board 3 / OMS Board 4 / DI/O Board 5 / DI/O Board 6 / DI/O Board 7 / DI/O Board 8 / DI/O Board 9 / DI/O Board 10 / SEI Board 11 / No 486C 12 / No seriplex 13 / No DI/O board 14 / No AO board 15 / Stepper board 16 / No spare 17 / No spare 18 / Stepper board 19 / AI Board 20 / AO Board 21 / AO Board 22 / Hard Disk Drive (HDD) 23 / No grounding JAC 24 / Convectron board 25 / Convectron board 26 / Convectron board 27 / Convectron board 28 / No TC 29 / No TC 30 / ION Gauge board 31 / ION Gauge board 32 / No spare 33 / DI/O Board 34 / DI/O Board 35 / DI/O Board 36 / DI/O Board 37 / DI/O Board 38 / No DI/O board 39 / No DI/O board 40 / Floppy Disk Drive (FDD) 41 / No spare 42 / Cryo temp 43 / AI Mux 44 / AI Mux 45 / No AI Mux 46 / No spare 47 / Opto detect board 48 / Opto detect board 49 / Opto detect board 50 / No spare UPS: 200 VAC, 3 Phase, 50/60 Hz, 350 A 1997 vintage.

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AMAT / APPLIED MATERIALS / AKT Endura 5500 is a high throughput, full-featured epitaxial reactor designed for use in semiconductor production. AKT Endura 5500 features a full-auto loader/unloader and multiple process chambers which allow for rapid process setup and optimized process uniformity. AMAT ENDURA 5500 is designed to provide high throughput for both small- and large-diameter epitaxial wafers. AMAT Endura 5500 supports a wide variety of process chemistries, including chemical vapor deposition (CVD) and molecular beam epitaxy (MBE), for the growth of various materials ranging from silicon, silicon-germanium, carbon-doped silicon, and other compounds. This flexibility accommodates the production of a variety of products, including traditional logic devices, MEMS (microelectromechanical systems), advanced logic, and optoelectronic components. The system features a unique, single-source remote control which simplifies process setup, and allows for full remote monitoring of up to three APPLIED MATERIALS ENDURA 5500 systems. This includes real-time access to multiple process parameters such as temperature, growth rate, and process pressure, in addition to allowing the user to company the process chamber directly. This data is invaluable for quickly finding and troubleshooting process issues. ENDURA 5500 offers a variety of process chamber configurations, constrained rafts, and box sizes, allowing for fast, efficient wafer cycling and large-volume production. The constrained rafts feature enhanced uniformity control, allowing wafers to be layed-out in a terraced fashion to ensure consistent thermal uniformity across the entire wafer. With a highly integrated camera system, automated wafer alignment is possible with four, six, eight, and twelve-inch wafers, ensuring consistent and accurate wafer handling and processing. APPLIED MATERIALS Endura 5500 also boasts an entirely automated wafer handling module, eliminating time-consuming manual wafer handling and loading. This includes Endura 5500's signature rotating cassette transfer system, allowing for continuous automated loading and unloading of up to ten wafer cassettes for uninterrupted production. Overall, AKT ENDURA 5500 is a premier, full-featured epitaxial reactor designed for fast, high-volume wafer production. The device is equipped with the latest in process chamber performance and automated wafer loading, as well as remote monitoring and optimized uniformity control, all of which ensure consistent, reliable production.