Used AMAT / APPLIED MATERIALS Endura 5500 #9363651 for sale

AKT/AMAT / APPLIED MATERIALS / AKT Endura 5500 is an advanced semiconductor wet cleaning reactor designed to meet the needs of the most complex and challenging semiconductor applications. This innovative reactor is designed to deliver a fast and efficient wet clean with superior surface finish and superior process control. It features an advanced plasma generator, a powerful UV-VIS light source, and a compact reactor chamber. AKT Endura 5500 is ideal for full-surface and limited-area cleaning of wafers and other substrates. It uses a proprietary, patented plasma generator to create a finely tuned atmosphere for optimal wet cleaning performance. The generator contains both Ar/H2 plasma production modules and UV-VIS light source modules that can be adjusted independently to produce precisely tuned plasma and light combinations. This allows for flexible cleaning configuration on a variety of different substrates. The reaction chamber of AMAT ENDURA 5500 is designed to provide maximum isolation of process gases and contaminants. Its advanced air-flow equipment and tight integration with the plasma generator ensures a gentle and uniform flow of cleaning solution even in the presence of high-pressure gas streams. The chamber also has high-efficiency filters to remove particle contamination from the process and longer chamber lifetimes. AMAT / APPLIED MATERIALS / AKT ENDURA 5500 is also designed with containment and safety features. It is equipped with a fully operational and integrated safety system that includes process monitoring modules, a unit controller, and a touchscreen interface. This ensures that the machine is operated safely and according to the prescribed procedures. APPLIED MATERIALS ENDURA 5500 is a reliable, efficient, and cost-effective wet-cleaning tool, designed to meet the highest expectations of wafer-processing customers. It combines pure plasma technology with the proven efficacy of wet cleaning to deliver superior process control and surface finish. With its advanced technologies, it is ideal for high-performance and precision applications in semiconductor manufacturing, and wafer-fabrication research and development.