Used AMAT / APPLIED MATERIALS Endura 5500 #9373105 for sale

AMAT / APPLIED MATERIALS / AKT Endura 5500 Reactor is a high-precision deposition equipment designed to create high quality thin-film microstructures for semiconductor and optoelectronic technologies. This system utilizes chemical vapor deposition (CVD), atomic layer deposition (ALD), and physical vapor deposition (PVD) processes to deposit ultrathin film layers on substrates. AKT Endura 5500 is highly customizable, allowing for modular design and customization for specific needs. AMAT ENDURA 5500 utilizes a glass heater tube that is compatible with all types of precursor chemistries. The tube can heat up to 950°C, and its wide temperature range allows the creation of thin Film layers under specific conditions. It has a dual-shutter configuration for fully automated sample handling, with fast loading and unloading times. The unit also features a high-performance automatic showerhead shutter, which optimizes the uniformity and thickness of thin films. AMAT Endura 5500 utilizes ceramic insulator liners for applications such as metalorganic CVD and ALD. It can also incorporate liners within a range of different materials for specialized deposition processes. The machine also features a fully automated pressure and composition control tool that adjusts the deposition pressure and chamber composition for each film deposition. This ensures optimal conditions are maintained throughout the entire process. For process validation and data collection, AMAT / APPLIED MATERIALS / AKT ENDURA 5500 incorporates automated endpoint detection systems such as quartz crystal microbalance (QCM), ellipsometry, and optical and electrical tests. This reactor also utilizes RF plasma and electrical barriers, allowing for uniform and repeatable deposition of thin films. ENDURA 5500 provides a wide range of process control and monitoring capabilities, such as multi-zone chamber temperature control, variable-power process gas positioning, and power ramping. APPLIED MATERIALS ENDURA 5500 offers an advanced uniformity control, which enables the ability to monitor and control both film thickness and uniformity. It can also provide in-situ deposition uniformity mapping capability in 2D/3D. In addition, its multi-zone temperature control asset enables the user to control the deposition rates of films to ensure that the process runs within the set specifications. Overall, Endura 5500 Reactor is an excellent choice for providing high-precision deposition of thin film microstructures. It offers a user-friendly interface, a variety of options to customize the process, and a wide range of process monitoring and control capabilities. Due to its versatility, this model is ideal for a range of applications, including semiconductor and optoelectronic technologies.