Used AMAT / APPLIED MATERIALS Endura CL #293807107 for sale

AMAT / APPLIED MATERIALS Endura CL
ID: 293807107
Wafer Size: 12"
PVD System, 12".
AMAT / APPLIED MATERIALS Endura CL is a chemical vapor deposition (CVD) reactor that is used for the deposition of thin films. It uses a cylinder-shaped plasma expansion zone in which the deposition process takes place. The reactor is equipped with a variety of features that enable precise layer control and better deposition uniformity. It features a heating system with two embedded sources, quartz rods and embedded water cooling. This helps to maintain a precise temperature range and enables greater control over the deposition process. Its flexibility facilitates varying process conditions for different films, including temperature, pressure, and gas flow. AMAT Endura CL is also capable of producing high-quality films with a wide dynamic range. The reaction chamber features a quartz dome and two electrodes, placed either side of the reactor. The electrodes are used to generate a plasma field, which helps to break down precursor gas molecules and form a uniform deposition. APPLIED MATERIALS Endura CL is also equipped with a gas distributor and anode that help to improve the uniformity of the film by controlling the process gas distribution. Additionally, its process control unit (PCU) offers precise control over the deposition process, including exact pressure levels, gas flow rate, and power settings. Endura CL is designed to achieve repeatable, controlled, stable deposition processes in a reliable and efficient manner. This makes it suitable for a wide range of applications, including semiconductor etching, optical coatings, and micro-machining. The versatile deposition of AMAT / APPLIED MATERIALS Endura CL makes it an ideal choice for precise deposition of fine-line films. With its seamless integration into AMAT production lines, AMAT Endura CL provides great flexibility and maximum value.
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