Used AMAT / APPLIED MATERIALS Endura CL #293821498 for sale

AMAT / APPLIED MATERIALS Endura CL is a cost-efficient, reliable semiconductor reactor for multiple processes. It has been designed for processing wafers of up to 300mm (12 inches). It utilizes a plasma enhanced chemical vapor deposition (PECVD) process to deposit thin layers between 10 and 400nm thick. AMAT Endura CL is equipped with a VTS (Volumetric Temperature Skeleton) that consists of a flat reinforced aluminum oxide edge. This is designed to withstand high temperatures and optimize thermal performance. The VTS is capable of quickly cycling in temperature, therefore improving the CVD quality and reducing the film level gradient of the different layers. In addition, APPLIED MATERIALS Endura CL is specially designed to reduce the environmental impact of the process. It does this by lowering the gas consumption and eliminating the need for liquid reactive gases (LRGs). Its gas-handling system ensures the accurate monitoring and management of the flow and purity of the gas being used in the deposition process. Endura CL was prototyped in the silicon wafer field of semiconductor fabrication, where it proved to be a reliable and accurate tool in the production of large batches of wafers. It has undergone numerous improvements in order to optimize the performance, enabling the cost and time efficiency of production. In addition to its efficient gas production, AMAT / APPLIED MATERIALS Endura CL is very easy to operate and maintain. It is equipped with intuitive software that allows users to set up the configuration for multiple process runs quickly and consistently. It also features an intelligent process control system that creates feedback for accurate process monitoring, thus reducing downtime. Furthermore, AMAT Endura CL is built with advanced safety features to reduce exposure to hazardous chemicals. It is compliant with the current NFPA's NFPA 70E safety requirements and the EU's ATEX 95 directive on dangerous substances. APPLIED MATERIALS Endura CL is designed to reduce cost whilst increasing productivity and customer satisfaction. Its upgraded features makes it the ideal reactor for semiconductor fabrication.