Used AMAT / APPLIED MATERIALS Endura CL #9236845 for sale

AMAT / APPLIED MATERIALS Endura CL is a type of chemical reactor used in the semiconductor industry to process and manufacture thin film structures. It is used for chemical vapor deposition (CVD), atomic layer deposition (ALD) and plasma-enhanced deposition (PED) of materials to create films. The reactor is designed for high uniformity and repeatability. AMAT Endura CL features a conformable showerhead source design with programmable shutter array. This allows for uniform and repeatable deposition of films over large area substrates. The source design has also been optimized to minimize byproduct formation and ensure high yields. The chamber is alsodesigned to enable rapid thermal ramp-up and cool-down times, enabling the deposition process to be completed quickly and efficiently. APPLIED MATERIALS Endura CL reactor uses a robust process control equipment that enables automated control of the process parameters. This allows for the precise control of the temperature, pressure, and gas flow rates during the deposition process. The system also supports flexibility in using up to three precursor gases and two reaction gases in the process. This enables for the chemistry of the film to be tuned for specific application requirements. Endura CL also features an in-situ plasma generator that is designed to ensure repeatable plasma etching processes. This allows for precise control of the etching process and can help to reduce the amount of undercut during the deposition process. The unit also supports etching of different materials, including metals, oxides, nitrides and other semi-conductors. AMAT / APPLIED MATERIALS Endura CL is designed for easy maintenance. The machine's chamber features a design that enables easy removal of the source and the floor plate components. This allows for quick access to the interior components of the tool and enables fast and efficient maintenance operations. The asset also features an advanced diagnostic model that enables quick diagnosis of any faults and helps to prevent unplanned downtime. In conclusion, AMAT Endura CL is a chemical reactor designed for depositing thin films for semiconductor applications. The equipment is designed for high uniformity and repeatability, with automated process control and fast ramp and cool down times. The system also features plasma etching capability and a robust diagnostic unit, helping to ensure reliable operation.