Used AMAT / APPLIED MATERIALS Endura CL #9237267 for sale
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ID: 9237267
Wafer Size: 12"
Vintage: 2004
System, 12", parts machine
EFEM: 2-Ports and KENSINGTON
DEGAS
PCII
Gen rack
Compressor
(2) AC Racks
Missing parts:
VHP Robot
Cable
2004 vintage.
AMAT / APPLIED MATERIALS Endura CL reaction equipment is an efficient and reliable high-throughput reactor designed to enable customers to optimize processes and material properties. AMAT Endura CL is an advanced, automated low-pressure chemical vapor deposition (LPCVD) solution designed to enable cost-effective production of precise in-line multi-layer films. APPLIED MATERIALS Endura CL is a vertical, bottom-up deposition system that processes one or two targets simultaneously at up to 300mm wafers per run. It features a user-friendly interface with an intuitive work table that allows users to easily transfer a wafer between processing platforms and rapidly access product parameters. Endura CL is engineered to provide high yields at short cycle times with the ability to process different films simultaneously at temperatures up to 800°C. The advanced controller monitors temperature, process gas flowrates, and pressure setting for precise control of process conditions with repeatable and consistent results—even when processing multiple batches. The chamber is equipped with a fully automated RF match network that ensures optimal plasma uniformity for improved process control and yields. AMAT / APPLIED MATERIALS Endura CL enables users to produce complex and precise multi-layer films with high levels of consistency and repeatability. The unit can deposit a range of high-density films typically used in semiconductor and display backplane applications including anti-reflection, passivation, p-spacer, barrier, and metal films. AMAT Endura CL also includes advanced diagnostic tools such as the real-time endpoint monitoring machine (REMS) and advanced uniformity mapping (AUM) to help users quickly adjust process parameters and optimize production yields. APPLIED MATERIALS Endura CL is a user-friendly, versatile reaction tool designed to meet the changing needs of the advanced manufacturing industry. It is a reliable and cost-effective way to produce precise multi-layer films with consistent and repeatable results.
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