Used AMAT / APPLIED MATERIALS Endura CL #9281532 for sale

AMAT / APPLIED MATERIALS Endura CL reactor is an advanced, drift- stabilized equipment for crystal growth and semiconductor processing that is ideal for deposition and diffusion processes in an ultra-high vacuum environment. The CL stands for Crystal Layer, referring to the highly reproducible thin films that can be produced in the reactor, while the Endura indicates the long-term stability of the deposition and diffusion processes. The system is equipped with dual filament sources, so two materials can be integrated into a single reactor chamber. The entire unit can be heated up to 1500°C through its helium-free quadruple heater, which utilizes induction heating for improved uniformity across the entire wafer. Furthermore, the machine has a power supply that can deliver up to 750A of direct current. The group E-beam gun is designed for precise, high-density source applications; it has a 3-axis scanner for uniformity in the distribution of electrical current density. It utilizes a high-power pulse modulator to provide maximum flux to the substrate and longer lifetimes in the LED or laser diodes. The design also incorporates a hot-wall type environment that results in higher uniformity for single-wafer processes. The diffusion and oxidation processes benefit from an inherently high temperature uniformity; the hot-wall design eliminates the need for additional uniformization techniques, allowing for greater control and precision in the deposition. The reaction chamber is a low-cost, closed-loop tool that leads to a cost-effective and uniform thin-film deposition. Additionally, it has a robot-integrated source exchanger that provides quick and easy access to various materials. To improve the deposition quality, the asset has a base-pressure feature, which allows for the precise control of the gas pressure within the process. Finally, the model has a profiling and feedback loop for equipment monitoring and process control, which provides detailed information about the process environment, process parameters, and system health and maintenance. Thus, AMAT Endura CL reactor ensures reliable and reproducible epitaxial growth, and offers excellent process efficiency, reliability, and uniformity.