Used AMAT / APPLIED MATERIALS Endura HP PVD #9364583 for sale

AMAT / APPLIED MATERIALS Endura HP PVD (Physical Vapor Deposition) reactor is a state-of-the-art semiconductor deposition equipment that enables high-precision and high-performance semiconductor manufacturing. This dry etching and deposition system is comprised of two general parts: a vacuum chamber and one or more gas sources. The vacuum chamber consists of an inner volume with walls that are made of either stainless steel or a ceramic material. During operation, the vacuum chamber is filled with an inert atmosphere, typically either argon or nitrogen. The unit also includes several gas sources that supply a variety of gases to the PVD chamber, including nitrogen, oxygen, and helium. Those gases can be simultaneously distributed into the PVD chamber, allowing for the creation of multi-layer films and metallization. The PVD process is typically conducted at a pressure range of 1-10 mTorr in the chamber, and at temperatures up to 1,200°C. The reactor's capacitively coupled, integrated plasma source can further tip the balance of ionized particles in favor of higher deposition rates. The plasma source and injectors are adjustable, allowing process engineers to fine-tune their processes to ensure optimal quality of the deposited films. AMAT Endura HP PVD reactor is equipped with state-of-the-art features, such as loading and wafer handling automation, auto-load retrieval, in-situ cleaning capabilities, temperature control, and precise target motion control, to ensure the high-precision deposition of materials. Additionally, the machine features 5-axis positioning for precise rotation control, and includes a surface exposure monitor and a built-in data logger to track process data for review. The benefits of APPLIED MATERIALS Endura HP PVD reactor include a reliable processing environment with superior process control, precise layer uniformly, and low defectivity. With this reactor, manufacturers are able to achieve robust and highly-functional film layers that are integral to the performance and reliability of future semiconductor devices. In summary, Endura HP PVD reactor is an advanced semiconductor deposition tool that combines superior process control with advanced features to deliver an optimal deposition of films.