Used AMAT / APPLIED MATERIALS Endura HP #293830651 for sale

AMAT / APPLIED MATERIALS Endura HP reactor is a piece of semiconductor process equipment used to create integrated circuits. It is a single-wafer lower pressure chemical vapor deposition (LPCVD) equipment designed to facilitate fabrication of a wide range of metals and polysilicon structures with extremely high precision and uniformity in a variety of gases. AMAT Endura HP can produce layers with thicknesses as low as 1 nanometer. The system is able to achieve an up to 5.5 inch uniform across the wafer's diameter, with a total of 5 different programmable wafer sizes available. The unit also offers adjustable sputter etch, in-situ pre-cleaning, and post-clean processes. It has a modular design which allows for easy integration with other equipment and a variety of materials. The machine is designed for high temperature operation, reaching a maximum temperature of up to 1,140° C. This ensures a high-performance, high-purity deposition environment. It has a high-quality gas distribution design which ensures uniformity across the wafer, delivering consistent deposition of the material. The device is designed for maximum flexibility to rapidly respond to changing process requirements. Its automation tool offers semi-automatic and full-auto mode that can be achieved using advanced plasma-based asset controls. The front-end loader offers wafer loading and unloading of both standard and randomly orientated wafers. It can be operated in a single-wafer or batch mode with up to 21 wafers at once. APPLIED MATERIALS Endura HP is highly reliable and offers low maintenance with no need for regular calibrations. Its process and time management feature helps reduce both time and wastage and maintain process quality. Furthermore, the model offers various safety features such as manual emergency stop, safe guard door and user prompting among others, ensuring safety for users and the environment. Overall, Endura HP is an advanced LPCVD equipment designed to provide precise, uniform deposition on a variety of semiconductor materials. Its wide range of features and functions make it an ideal choice for a variety of fabrication applications.