Used AMAT / APPLIED MATERIALS Endura HP #9085295 for sale

AMAT / APPLIED MATERIALS Endura HP is a tool used to ensure reliable wafer fabrication for many advanced microelectronics devices. It is an architecture that consists of two features: an etch/ash chamber and a deposition chamber, both of which utilize an advanced built-in plasma source and chamber design. The plasma source helps to produce reactive gases such as fluorocarbons, hydrogen, and nitrogen which then react with a semiconductor material and cause chemical reaction. This ultimately leads to an efficient deposition and etching process. AMAT Endura HP's chamber design includes a magnetically assisted coil which allows for consistent, repeatable, and even plasma uniformity throughout the entire reactor chamber. It also has a load lock capability which allows the user to load and unload wafers without exposing them to the environment outside of the reactor. This feature helps maintain process stability and repeatability throughout the multiple-batch manufacturing process. APPLIED MATERIALS Endura HP's etch/ash chamber can be used to etch and passivate various materials such as silicon dioxide and silicon nitride. The substrate can also be subjected to various temperatures, pressures, and other paramaters to enhance the process quality. The deposition chamber can be used to deposit materials such as metals or dielectrics and is designed to meet high accuracy and process repeatability. This reactor's process control technology is based on advanced control system software which can control parameters such as temperature, pressure and voltage, and ensure repeatable, optimal results for multiple batches. This includes Load Lock and Synchronization features to further increase the process reliability. Endura HP reactor is also compatible with multiple hazardous gases and allows for remote user access for process monitoring and maintenance. Additionally, AMAT / APPLIED MATERIALS Endura HP can also be used in a wide recipe range from low temperatures to higher temperatures. The furnace chamber can operate from 30-500°C and is equipped with multiple components to provide uniform temperature distribution and proper control. Overall, AMAT Endura HP reactor is an ideal choice for many microelectronics manufacturing applications due to its versatile design and advanced process control technology. It provides reliable and repeatable wafer fabrication processes along with long-term reliability and enhanced performance.