Used AMAT / APPLIED MATERIALS Endura II #117295 for sale
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ID: 117295
Wafer Size: 12"
Vintage: 2006
ALD PVD chamber, 12"
Gen 1
TaN BFBE
Leybold turbo
2006 vintage
As-is, where-is.
AMAT / APPLIED MATERIALS / AKT Endura II is a high-performance thermal chemical vapor deposition (CVD) reactor capable of producing thick, high-quality films that have excellent stability. AKT Endura II is used to deposit a variety of materials, including dielectrics, conductors, barrier layers, and organic compounds. AMAT Endura II offers superior uniformity, superior rate control and superior wafer repeatability. APPLIED MATERIALS Endura II is used to produce thick films that have excellent process stability and uniformity. The end product is highly-stable, uniform and defect-free films. Endura II is a single-zone, horizontal CVD reactor that consists of a hot-zone (substrate holder assembly) and an RF-plasma generator. The hot zone consists of a heated substrate holder, sample stage, and variable-speed motor. The RF-plasma generator provides the CVD process with radiation energy. AMAT / APPLIED MATERIALS / AKT Endura II allows for precise control of deposition rate, with a range of 5 to 250 nm/s for high-rate deposition and 0.01 to 5 nm/s for low-rate deposition. AKT Endura II utilizes a multi-frequency plasma source for improved film uniformity and process stability. The generator is designed to optimize the plasma generation and to reduce the profile of the process. This helps ensure that the deposition uniformity is maximized while the process remains both stable and repeatable. The multi-frequency plasma source also reduces the wafer-to-wafer repeatability of the process. AMAT Endura II also incorporates a unique multiple-length showerhead design that allows for excellent deposition uniformity. The showerhead consists of a series of tiers each of which has a different length to enable uniform deposition along the length of the chamber. Furthermore, APPLIED MATERIALS Endura II is able to use a wide range of temperatures to accommodate different deposition recipes. Endura II is designed to be used in applications that require high-quality CVD process such as microelectronics, MEMS, and optoelectronic device fabrication. AMAT / APPLIED MATERIALS / AKT Endura II is capable of depositing dielectric and organic materials as well as barrier layers. AKT Endura II's unique design and advanced process capabilities make it the ideal choice for applications requiring highly uniform deposition, excellent repeatability, and process stability.
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