Used AMAT / APPLIED MATERIALS Endura II #293615240 for sale

AMAT / APPLIED MATERIALS / AKT Endura II is a reactor designed for multiple CVD, etch, and diffusion process applications in the semiconductor and related industries. It is an advanced tool, capable of delivering excellent process performance, repeatable results, increased throughput, and an extended lifetime. AKT Endura II is an inline RIE (Reactive-Ion Etch) tool that uses a dual or a single microwave RF (Radio Frequency) generator to provide the necessary power for etching of the wafer surface. The 2 Chamber configuration provides for the use of up to two etch gases for the etching process. The tool features a linear scanning electron beam (ESB) to desorb the reaction gases and to precisely control the etch depth. The ESB also assists in supporting smaller-structure etches. AMAT Endura II's Endura RIE (E-RIE) technology provides uniform etching of the semiconductor structure while minimizing endpoint dependence. APPLIED MATERIALS Endura II offers a complete range of process control capabilities, such as power control, temperature control, flow control, exposure time control, and reactive-ion etching. It also offers a high degree of substrate flexibility, allowing for easy adaptation to new process environments. Endura II is designed for etch and deposition applications, enabling users to perform both processes in the same chamber in a single-step operation. AMAT / APPLIED MATERIALS / AKT Endura II is equipped with proprietary embedded software that allows for process automation and optimization. This software also helps ensure repeatability of processes, improved overall yields, and greater reliability in IC fabrication. The tool also features built-in safety safeguards, both hardware and software, to ensure safety of processes and personnel. Additionally, its modular design allows for easy installation, set-up and maintenance. AKT Endura II is built for the production of high-quality semiconductor devices, offering superior process control and optimization features. Its compact footprint and efficient operation make it well suited for both production floor and research and development applications, while users benefit from reliable, repeatable results and increased throughput.