Used AMAT / APPLIED MATERIALS Endura II #293615241 for sale

AMAT / APPLIED MATERIALS / AKT Endura II is a highly advanced reactor designed for advanced material deposition processes. It is capable of depositing various materials such as polysilicon, silicon germanium, Pt/Au, high-k/metal-gate, and inter-mediate dielectric layers. It boasts a high-throughput non-line-of-sight production of high-end integrated circuit products, providing an unprecedented level of productivity and flexibility in the semiconductor industry. AKT Endura II is a large-scale cluster-tool configured with up to four separate reactors arranged in an X-Y configuring with up to 52 thermal localized delivery systems. Combined with the Endura Control Console, this enables robust and precise multi-process deposition from 5-500 nm. The reactor also offers configurable process-coupled high-throughput wafer cleaning. It has a uniform process capability, omni-directional source-to-substrate capability, and comprehensive safety features. The reactor has a process flexibility that allows full thermal control over substrate temperature as low as 250° C and substrate bias up to +/- 1000V. This in turn allows for deposition of intricate high-aspect-ratio features often required by I.C. products. It also has a unique rf modulation capability which allows for 3D patterning of dielectric layers and Pt/Au or other materials in the production of advanced I.C.s. It also features three interchangeable gas-injection modules that enable gas-mixture tuning or variation of the inert gas chamber within a single cycle. AMAT Endura II has a decision-based system that utilizes feedback from sensors and diagnostic tools to display process parameters and monitor valuable system integrity information. This enables the reactor to quickly understand and adapt to a range of parameters such as ambient environment, temperature, and pressure. It also helps prevent the occurrence of downtime due to unexpected conditions. Finally, APPLIED MATERIALS Endura II utilizes an intuitive user interface that incorporates virtual diagnostics, process parameter adjustments and several security functions. This helps streamline the entire process, making it simpler to use and more efficient than ever before. The result is a versatile, flexible, and efficient tool that significantly reduces the time and labor associated with advanced materials deposition.